Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Deposition Characteristics of TiO2 Thin Films Prepared by DC Pulsed Magnetron Sputtering

DC 펄스 마그네트론 스퍼터링으로 증착된 TiO2 박막의 특성변화에 관한 연구

  • An, Eunsol (Korea Institute of Industrial Technology (KITECH)) ;
  • Heo, Sung-Bo (Korea Institute of Industrial Technology (KITECH)) ;
  • Kim, Kyu-Sik (Korea Institute of Industrial Technology (KITECH)) ;
  • Jung, Uoo Chang (Korea Institute of Industrial Technology (KITECH)) ;
  • Park, Yong Ho (School of Materials Science and Engineering, Pusan National University) ;
  • Park, In-Wook (Korea Institute of Industrial Technology (KITECH))
  • Received : 2015.04.27
  • Accepted : 2015.04.29
  • Published : 2015.04.30
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Abstract

This study reports a fabrication of $TiO_2$ on the surface of dental implants by pulsed d.c. magnetron sputtering from a Ti target. A systematic investigation on the microstructure and mechanical properties of $TiO_2$ films was carried out with the variation of $O_2$ contents and substrate temperatures. The effects of deposition parameters on the fabricated structures were investigated by X-ray diffraction (XRD) technique and field emission scanning electron microscope (FE-SEM). Hydrophilic properties were evaluated by measuring water contact angles on the film surface. With increasing $O_2$ contents up to 40%, surface roughness of $TiO_2$ film increased while relatively smooth surface was obtained with 50% $O_2$ contents. Surface roughness and adhesion strength both increased as substrate temperature increased up to $200^{\circ}C$. From these results, hydrophilic and adhesive properties of the present $TiO_2$ films synthesized with 40% $O_2$ at $200^{\circ}C$ are regarded to be suitable for bio-compatible applications.

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