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Plasma Monitoring by Multivariate Analysis Techniques

다변량 분석기법을 통한 플라즈마 공정 모니터링 기술

  • 장해규 (성균관대학교 나노과학기술학과) ;
  • 고경범 (성균관대학교 화학공학부) ;
  • 이호녕 (성균관대학교 반도체디스플레이공학과) ;
  • 채희엽 (성균관대학교 화학공학부)
  • Published : 2015.12.30
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Abstract

Plasma diagnosis and multivariate analysis techniques for plasma processes are reviewed. The principles and applications of optical emission spectroscopy (OES) and VI probe are discussed briefly. The research results of principal component analysis (PCA), one of the widely used multivariate analysis techniques for plasma process monitoring is discussed in this article.

Keywords

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