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http://dx.doi.org/10.5757/vacmac.2.4.27

Plasma Monitoring by Multivariate Analysis Techniques  

Jang, Haegyu (성균관대학교 나노과학기술학과)
Koh, Kyongbeom (성균관대학교 화학공학부)
Lee, Honyoung (성균관대학교 반도체디스플레이공학과)
Chae, Heeyeop (성균관대학교 화학공학부)
Publication Information
Vacuum Magazine / v.2, no.4, 2015 , pp. 27-32 More about this Journal
Abstract
Plasma diagnosis and multivariate analysis techniques for plasma processes are reviewed. The principles and applications of optical emission spectroscopy (OES) and VI probe are discussed briefly. The research results of principal component analysis (PCA), one of the widely used multivariate analysis techniques for plasma process monitoring is discussed in this article.
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