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첨단 나노소자 공정제어용 측정기술 연구

Studies of process measurement technology for manufacturing advanced nano devices

  • 발행 : 2015.09.30

초록

We developed a real-time three-polarizer spectroscopic ellipsometer based on a new data acquisition algorithm and a general data reduction (the process of extracting the ellipsometric sample parameters from the Fourier coefficients). The data acquisition algorithm measures Fourier coefficients of radiant flux waveform accurately and precisely. The general data reduction is introduced to represent the analytic functions of the standard uncertainties of the ellipsometric sample parameters, and the extracted theoretical values closely agree with the corresponding experimental data. Our approach can be used for optimization of measurement conditions, instrumentation, simulation, standardization, laboratory accreditation, and metrology.

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참고문헌

  1. www.itrs.net, Technology Roadmap for Semiconductors (2011).
  2. S. Zollner, "Spectroscopic Ellipsometry for Inline Process Control in the Semiconductor Industry," in Ellipsometry at the Nanoscale, M. Losurdo and K. Hingerl, ed. (Springer, Berlin, 2013), Chap. 18.
  3. Y. J. Cho, W. Chegal, J. P. Lee, and H. M. Cho, Opt. Express 23, 16481 (2015). https://doi.org/10.1364/OE.23.016481
  4. Y. J. Cho, W. Chegal, and H. M. Cho, Opt. Lett. 36, 118 (2011). https://doi.org/10.1364/OL.36.000118
  5. H. G. Tompkins and E. A. Irene, Handbook of Ellipsometry (William Andrew, New York, 2005).
  6. W. Chegal, J. P. Lee, H. M. Cho, S. W. Han, Y. J. Cho, J. Opt. Soc. Am. A 30, 1310 (2013). https://doi.org/10.1364/JOSAA.30.001310
  7. Y. J. Cho, W. Chegal, and H. M. Cho (to be submitted).