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전자빔 조사에 따른 In2O3/Ti 적층박막의 전기적, 광학적 특성 변화

Influence of Electron Irradiation on the Structural Electrical and Optical Properties of ITO/Ti bi-layered Films

  • 투고 : 2015.10.13
  • 심사 : 2015.10.29
  • 발행 : 2015.12.30

초록

We have considered the influence of electron irradiation on the optical and electrical properties of $In_2O_3/Ti$ bi-layered films prepared with RF and DC magnetron sputtering. The $In_2O_3/Ti$ thin films irradiated at 600 eV shows the lowest resistivity of $6.9{\times}10^{-4}{\Omega}cm$. The optical transmittance in a visible wave length region also influenced with the electron irradiation energy. The film that electron irradiated at 600 eV shows 82.9% of optical transmittance in this study. By comparison of figure of merit, it is concluded that the opto-electrical performance of $In_2O_3/Ti$ bi-layered film is improved with electron irradiation.

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참고문헌

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