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Silicon기반 고감도 PIN Photodiode의 전기적 및 광학적 특성 분석

Analysis of Electrical and Optical Characteristics of Silicon Based High Sensitivity PIN Photodiode

  • Lee, Jun-Myung (Department of Information and Communication Engineering, Wonkwang University) ;
  • Kang, Eun-Young (Department of Information and Communication Engineering, Wonkwang University) ;
  • Park, Keon-Jun (Department of Information and Communication Engineering, Wonkwang University) ;
  • Kim, Yong-Kab (Department of Information and Communication Engineering, Wonkwang University) ;
  • Hoang, Geun-Chang (Department of Microelectronics and Display Technology, Wonkwang University)
  • 투고 : 2014.04.14
  • 심사 : 2014.06.09
  • 발행 : 2014.06.30

초록

근적외선 파장대역 850 nm ~ 1000 nm에서 레이저를 검출하기 위해 포토다이오드의 분광감응도를 향상시키고자 본 논문에서 실리콘 기반 고감도 PIN 포토 다이오드를 제작하고 전기적 및 광학적 특성을 분석하였다. 제작된 소자는 TO-18형으로 패키징 하였고 포토다이오드의 전기적 특성으로 역 바이어스 전압이 5V일 때 암전류는 Anode 1과 Anode 2는 약 0.055 nA 의 값을 나타내었으며 정전용약은 0V 일 때 1 kHz 주파수 대역에서 약 19.5 pF, 200 kHz 주파수 대역에서 약 19.8 pF의 적은 정전용약을 나타내었다. 또한 출력신호의 상승시간은 10 V의 전압일 때 약 30 ns의 고속 응답특성을 확인하였다. 광학적 특성 분석으로는 880 nm에서 최대 0.66 A/W의 분광감응도 값을 나타내었고 1000 nm에서는 0.45 A/W로 비교적 우수한 분광감응도를 나타내었다.

In order to improve spectrum sensitivity of photodiode for detection of the laser at 850 nm ~ 1000 nm of near-infrared wavelength band, this study has produced silicon-based fast film PIN photodiode and analyzed electrical and optical properties. The manufactured device is packaged in TO-18 type. The electrical properties of the dark currents both Anode 1 and Anode 2 have valued of approximately 0.055 nA for 5 V reverse bias, while the capacitance showed 19.5 pF at frequency range of 1 kHz and about 19.8 pF at the range of 200 kHz for 0 V. In addition, the rising time of output signal was verified to have fast response time of about 30 ns for 10 V. For the optical properties, the best spectrum sensitivity was 0.66 A/W for 880 nm, while it was relatively excellent value of 0.45 A/W for 1,000 nm.

키워드

참고문헌

  1. C. Z. Zhou, and W. K. Warburton, "Noise analysis of low noise, high count rate, PIN diode X-ray detectors," IEEE Transactions on Nuclear Science, vol. 43, no. 3, pp. 1385-1390, Jun. 1996. https://doi.org/10.1109/23.507071
  2. C. R. Tull, J. S. Iwanczyk, B. E. Patt, G. Vilkelis, V. Eremin, E. Verbitskaya, N. Strokan, I. I1'yashenko, A. Ivanov, A. Sidorov, N. Egorov, S. Golubkov, and K. Kon'kov, "New High Sensitivity Silicon Photodetectors for Medical Imaging Application," IEEE Transactions on Nuclear Science, vol. 50, no. 4, pp. 1225-1228, Aug. 2003. https://doi.org/10.1109/TNS.2003.815174
  3. G. F. Dalla Betta, G. U. Pignatel, G. Verzellesi, and M. Boscardin, "Si-PIN X-ray detector technology," Nuclear Instruments and Methods, vol. 395, no. 3, pp. 344-348, Aug. 1997. https://doi.org/10.1016/S0168-9002(97)00612-8
  4. S. Y. Oh, "Semiconductor Technology and Industrial Trend," Seoul National University Advanced Institute of Convergence Technology, Apr. 2011.
  5. B. J. Lee, "Polymer thin film organic transistor characteristics with plasma treatment of interlayers," J. of The Korea Institute of Electronic Communication Sciences, vol. 8, no. 6, pp. 797-804, 2013. https://doi.org/10.13067/JKIECS.2013.8.6.797
  6. KISTI MIRIAN. Available: http://mirian.kisti.re.kr/.
  7. J. M. Park, "The optical characteristics of silicon photodetectors and the leakage current of silicon radiation detectors," Doctor's Thesis, Chon-Buk National University, 2010.