참고문헌
- Jha, A. R., "Solar cell Technology and Applications", Auerbach Publications, 2009.
- Dimroth, F., Kurtz, S., "High-efficiency Multi Junction Solar Cells," MRS BULLETIN, Vol. 32, pp. 230-235, 2007. https://doi.org/10.1557/mrs2007.27
- Vazsonyi, E., De Clercq, K., Einhaus, E., Kerschaver, V., Said, K., Poortmans, J., Szlufcik, J., Nijs, J., "Improved anisotropic etching process for industrial texturing of silicon solar cells", Sol. Energy Mater. Sol. Cells, Vol. 57 pp. 179-188, 1999. https://doi.org/10.1016/S0927-0248(98)00180-9
- Iencinella, D. , Centurioni, E., Rizzoli, R., Zignani, F., "An optimized texturing process for silicon solar cell substrates using TMAH", Sol. Energy Mater. Sol. Cells, Vol. 87, pp. 725-732, 2005. https://doi.org/10.1016/j.solmat.2004.09.020
- Dekkers, H. F. W., Duerinckx, F., Szlufcik, J., Nijs, J., "Silicon surface texturing by reactive ion etching", OPTO-Electronics review Vol. 8, pp. 311-316, 2000.
- Yoo, J.S., Parm, I.O., Gangopadhyay, U., Kim, K., Dhungel, S. K., Mangalaraj, D., Yi, J., "Black silicon layer formation for application in solar cells", Solar Energy Materials & Solar Cells Vol. 90, pp. 3085-3093, 2006. https://doi.org/10.1016/j.solmat.2006.06.015
-
Yoo, J. Kim, K., Thamilselvan, M., Lakshminarayn, N., Kim, Y., Lee, J., Yoo, K., Yi, J., "RIE texturing optimization for thin c-Si solar cells in
$SF_{6}/O_{2}$ plasma", Journal of Physics D: applied physics, Vol. 41, pp. 125205, 2008. https://doi.org/10.1088/0022-3727/41/12/125205 - Mehran, M., Sanaee, Z., Abdolahad, M., Mohajerzadeh, S., "Controllable silicon nano-grass formation using a hydrogenation assisted deep reactive ion etching". Materials Science in Semiconductor Processing, Vol. 14, pp. 199-206, 2011. https://doi.org/10.1016/j.mssp.2011.02.014
-
Jansen, H.V., Boer, de M.J., Ma, K., Girones, M., Unnikrishnan, S., Louwerse, M.C., Elwenspoek, M.C., "Black silicon method XI: oxygen pulses in
$SF_{6}$ plasma", journal of micromechnics and microengineering, Vol. 20, pp. 1-12, 2010. - Park, H., Lee, J. S., Kwon, S., Yoon, S., Kim, D., "Effect of surface morphology on screen printed solar cells", Current Applied Physics, Vol. 10, pp.113-118, 2010. https://doi.org/10.1016/j.cap.2009.05.005
- Santbergen, R., van Zolingen, R. J. C., "The absorption factor of crystalline silicon PV cells:A numerical and experimental study", Solar Energy Materials & Solar Cells Vol. 92, pp. 432-444, 2008. https://doi.org/10.1016/j.solmat.2007.10.005
- Jo, J., Kong, D., Cho, C., Kim, B., Bae, Y., Lee, J., "Black Silicon of Pyramid Structure Formation According to the RIE Process Condition", Journal of Sensor Science and Technology, Vol. 20, No. 3 pp. 207-212, 2011. https://doi.org/10.5369/JSST.2011.20.3.207
-
Dixit, P., Miao, J., "Effect of
$SF_{6}$ flow rate on the etched surface profile and bottom grass formation in deep reactive ion etching process", Journal of Physics: Conference Series Vol. 34, pp. 577-582, 2006. https://doi.org/10.1088/1742-6596/34/1/095 -
Burtsev, A., Li, Y. X., Zeijl, H. W., Beenakker, C. I. M, "An anisotropic U-shaped
$SF_{6}$ -based plasma silicon trench etching investigation", Microelectronic Engineering Vol. 40, pp. 85-97, 1998. https://doi.org/10.1016/S0167-9317(98)00149-X - Jansen, H., de Boer, M., Burger, J., Legtenberg, R., Elwenspoek, M., "The black silicon method II: The effect of mask material and loading on the reactive ion etching of deep silicon trenches", Microelectronic Engineering Vol. 27, pp. 475-480, 1995 https://doi.org/10.1016/0167-9317(94)00149-O
- Robbins, H., Schwartz, B., "Chemical etching of silicon 1", Journal of the Electrochemical Society, Vol.106, pp.505 -508, 1961.