반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

반도체용 저온 열처리로의 Flat Zone 확장 및 온도편차 감소에 관한 연구

Study on the Flat Zone Expansion and Temperature Deviation Reduction of Low Temperature Furnace for Semiconductor Process

  • 주강우 (한국기술교육대학교 메카트로닉스공학부) ;
  • 심승술 ((주)예스티) ;
  • 장혁 ((주)제이엘티) ;
  • 이유영 (한국폴리텍대학 아산캠퍼스) ;
  • 김광선 (한국기술교육대학교 메카트로닉스공학부)
  • 투고 : 2014.12.04
  • 심사 : 2014.12.22
  • 발행 : 2014.12.31
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초록

This paper is about the yield rate of lower temperature furnace for wafer heat-treatment. The flat-zone that the temperature in furnace has uniform distribution specific area is the significant variable to the yield rate. In this study, we researched about the ways how to widen the flat zone in the furnace using CFD. As a result, we confirmed that the characteristic of the flat-zone was changed when SCU(Super Cooling Unit) was used. We considered temperature control with above.

키워드

참고문헌

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