Transactions on Electrical and Electronic Materials

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Nitrogen Incorporation of Nanostructured Amorphous Carbon Thin Films by Aerosol-Assisted Chemical Vapor Deposition

  • Fadzilah, A.N. (NANO-ElecTronic Centre, Faculty of Electrical Engineering, Universiti Teknologi MARA) ;
  • Dayana, K. (NANO-ElecTronic Centre, Faculty of Electrical Engineering, Universiti Teknologi MARA) ;
  • Rusop, M. (NANO-ElecTronic Centre, Faculty of Electrical Engineering and NANO-SciTech Centre, Institute of Science, Universiti Teknologi MARA)
  • Received : 2013.03.13
  • Accepted : 2013.06.21
  • Published : 2013.08.25
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Abstract

Nanostructured pure a-C and nitrogen doped a-C: N thin films with small particle size of, ~50 nm were obtained by Aerosol-assisted CVD method from the natural precursor camphor oil. Five samples were prepared for the a-C and a-C: N respectively, with the deposition temperatures ranging from $400^{\circ}C$ to $600^{\circ}C$. At high temperature, the AFM clarifies an even smoother image, due to the increase of the energetic carbon ion bombardment at the surface of the thin film. An ohmic contact was acquired from the current-voltage solar simulator characterization. The higher conductivity of a-C: N, of ${\sim}{\times}10^{-2}Scm^{-1}$ is due to the decrease in defects since the spin density gap decrease with the nitrogen addition. Pure a-C exhibit absorption coefficient, ${\alpha}$ of $10^4cm^{-1}$, whereas for a-C:N, ${\alpha}$ is of $10^5cm^{-1}$. The high ${\sigma}$ value of a-C:N is due to the presence of more graphitic component ($sp^2$ carbon bonding) in the carbon films.

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References

  1. M. Tan, J. Zhu, J. Han, W. Gao, A. Liu, X. Han, Materials Research Bulletin 43 (2008) 453-462 [DOI: http://dx.doi.org/10.1016/j.materresbull.2007.07.033].
  2. J. Podder, M. Rusop, T. Soga, T. Jimbo, Diamond and Related Materials 14 1799-1804 [DOI: http://dx.doi.org/10.1016/j.diamond.2005.07.020].
  3. S. M. Mominuzzaman, M. Rusop, T. Soga, T. Jimbo, M. Umeno, Solar Energy Materials and Solar Cells 90 (2006) 3238-3243 [DOI: http://dx.doi.org/10.1016/j.solmat.2006.06.037].
  4. X. Hou, K. L. Choy, Chemical Vapor Deposition 12 (2006) 583-596 [DOI: http://dx.doi.org/10.1002/cvde.200600033].
  5. A. Salaun, J. A. Hamilton, D. Iacopino, S. B. Newcomb, M. G. Nolan, S. C. Padmanabhan, I. M. Povey, M. Salaun, M. E. Pemble, Thin Solid Films 518 6921-6926 [DOI: http://dx.doi.org/10.1016/j.tsf.2010.07.051].
  6. U. Qureshi, C. W. Dunnill, I. P. Parkin, Applied Surface Science 256 (2009) 852-856 [DOI: http://dx.doi.org/10.1016/j.apsusc.2009.08.074].
  7. R. S. Singh, V. K. Rangari, S. Sanagapalli, V. Jayaraman, S. Mahendra, V. P. Singh, Solar Energy Materials and Solar Cells 82 (2004) 315-330 [DOI: http://dx.doi.org/10.1016/j.solmat.2004.02.006].
  8. A. Belaidi, R. Bayon, L. Dloczik, K. Ernst, M. C. Lux-Steiner, and R. Könenkamp, "Comparison of different thin film absorbers used in eta-solar cells," Thin Solid Films, vol. 431-432, pp. 488-491, 2003 [DOI: http://dx.doi.org/10.1016/S0040-6090(03)00223-2].
  9. S. Nitta, M. Aono, T. Katsuno, Y. Naruse, Diamond and Related Materials 12 (2003) 219-226 [DOI: http://dx.doi.org/10.1016/S0925-9635(03)00073-6].
  10. H. Kim, J. C. Jung, D. R. Park, S.-H. Baeck, I. K. Song, Applied Catalysis A: General 320 (2007) 159-165 [DOI: http://dx.doi.org/10.1016/j.apcata.2007.01.034].
  11. Z. Yang, Y. Xia, X. Sun, R. Mokaya, The Journal of Physical Chemistry B 110 (2006) 18424-18431 [DOI: http://dx.doi.org/10.1021/jp0553737].
  12. P.-X. Hou, H. Orikasa, T. Yamazaki, K. Matsuoka, A. Tomita, N. Setoyama, Y. Fukushima, T. Kyotani, Chemistry of Materials 17 (2005) 5187-5193 [DOI: http://dx.doi.org/10.1021/cm051094k].
  13. L. Valentini, J. M. Kenny, G. Carlotti, M. Guerrieri, G. Signorelli, L. Lozzi, S. Santucci, Thin Solid Films 389 (2001) 315-320 [DOI: http://dx.doi.org/10.1016/S0040-6090(01)00879-3].
  14. Y. S. Park, B. Hong, Journal of Non-Crystalline Solids 354 (2008) 5504-5508 [DOI: http://dx.doi.org/10.1016/j.jnoncrysol.2008.08.007].
  15. P. Hagouel, Circuits and Devices Magazine, IEEE 15 (1999) 36-36 [DOI: http://dx.doi.org/10.1109/101.747566].
  16. Y. Miyajima, S. Nitta, S. R. P. Silva, D. A. Zeze, Thin Solid Films 491 (2005) 161-167 [DOI: http://dx.doi.org/10.1016/j.tsf.2005.06.033].
  17. B. Sasi, K. G. Gopchandran, Solar Energy Materials and Solar Cells 91 (2007) 1505-1509 [DOI: http://dx.doi.org/10.1016/j.solmat.2007.04.019].
  18. A. Belaidi, R. Bayon, L. Dloczik, K. Ernst, M. C. Lux-Steiner, and R. Konenkamp, "Comparison of different thin film absorbers used in eta-solar cells," Thin Solid Films, vol. 431-432, pp. 488-491, 2003 [DOI: http://dx.doi.org/10.1016/S0040-6090(03)00223-2].
  19. L. Y. Huang, L. Meng, Materials Science and Engineer-ing: B 137 (2007) 310-314 [DOI: http://dx.doi.org/10.1016/j.mseb.2006.11.029].
  20. M. Rusop, S. Adhikari, A. M. M. Omer, T. Soga, T. Jimbo, M. Umeno, Diamond and Related Materials 15 (2006) 6 [DOI:http://dx.doi.org/10.1016/j.diamond.2005.07.034].
  21. A. Liu, H. Wu, J. Zhu, J. Han, L. Niu, Diamond and Related Materials 17 (2008) 1927-1932 [DOI: http://dx.doi.org/10.1016/j.diamond.2008.04.008].
  22. F. Alibart, O. Durand Drouhin, M. Lejeune, M. Benlahsen, S. E. Rodil, E. Camps, Diamond and Related Materials 17 (2008) 925-930 [DOI: http://dx.doi.org/10.1016/j.diamond.2008.01.080].
  23. J. L. Endrino, D. Horwat, A. Anders, J. Andersson, R. Gago, Plasma Processes and Polymers 6 (2009) S438-S443 [DOI: http://dx.doi.org/10.1002/ppap.200931003].
  24. H. Zhu, J. Wei, K. Wang, D. Wu, Solar Energy Materials and Solar Cells 93 (2009) 1461-1470 [DOI: http://dx.doi.org/10.1016/j.solmat.2009.04.006].
  25. D. Pradhan, M. Sharon, Applied Surface Science 253 (2007) 7004-7010 [DOI : ht tp://dx.doi.org/10.1016/j.apsusc.2007.02.030].
  26. M. Rusop, S. Adhikari, A. M. M. Omer, T. Soga, T. Jimbo, M. Umeno, Diamond and Related Materials 15 (2006) 371-377 [DOI: http://dx.doi.org/10.1016/j.diamond.2005.07.034].
  27. S. Adhikari, D. C. Ghimire, H. R. Aryal, S. Adhikary, H. Uchida, M. Umeno, Diamond and Related Materials 15 (2006) 1909-1912 [DOI: http://dx.doi.org/10.1016/j.diamond.2006.07.022].
  28. T. J, Materials Research Bulletin 3 (1968) 37-46 [DOI: http://dx.doi.org/10.1016/0025-5408(68)90023-8].
  29. G. Kalita, H. R. Aryal, S. Adhikari, D. C. Ghimire, R. A. Afre, T. Soga, M. Sharon, M. Umeno, Diamond and Related Materials 17 (2008) 1697-1701 [DOI: http://dx.doi.org/10.1016/j.diamond.2008.01.046].
  30. B. K. Tay, X. Shi, E. J. Liu, H. S. Tan, L. K. Cheah, Thin Solid Films 346 (1999) 155-161 [DOI: http://dx.doi.org/10.1016/S0040-6090(98)01756-8].
  31. L. K. Cheah, X. Shi, J. R. Shi, E. J. Liu, S. R. P. Silva, Journal of Non-Crystalline Solids 242 (1998) 40-48 [DOI: http://dx.doi.org/10.1016/S0022-3093(98)00787-X].