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Analysis of nano-cluster formation in the PECVD process

  • Yun, Yongsup (Division of Marine System Engineering, Korea Maritime University)
  • Received : 2012.11.20
  • Accepted : 2013.02.28
  • Published : 2013.03.31

Abstract

In this paper, the ultra water-repellent thin films were prepared by RF PECVD. On the basis of surface morphology, chemical bonding states and plasma diagnostics, a formation model of clusters for the ultra water-repellent films was discussed from considerations of formation process and laser scattering results. Moreover, using laser scattering method, the relative change of quantity of nano-clusters or size of agglomerates could be confirmed. From the results, the films were deposited with nano-clusters and those of agglomerates, which formed in organosilicon plasma, and formation of agglomerates were depended on the deposition time.

Keywords

References

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  1. Plasma-polymerized Particles from Organosilane Molecules and Microstructure of Their Deposits vol.29, pp.3, 2016, https://doi.org/10.2494/photopolymer.29.419