Journal of the Korea Academia-Industrial cooperation Society (한국산학기술학회논문지)

The Korea Academia-Industrial cooperation Society (한국산학기술학회)
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A Study on the Filling Process and Residual Layer Formation in Nanoimprint Lithography Process

나노임프린트 공정에서의 충전과정과 잔류층 형성에 관한 연구

  • Lee, Ki-Yeon (Department of Mechanical Engineering, SoonChunHyang University) ;
  • Kim, Kug-Weon (Department of Mechanical Engineering, SoonChunHyang University)
  • 이기연 (순천향대학교 기계공학과) ;
  • 김국원 (순천향대학교 기계공학과)
  • Received : 2012.07.03
  • Accepted : 2012.09.06
  • Published : 2012.09.30
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Abstract

Nanoimprint lithography (NIL) is an emerging technology enabling cost-effective and high-throughput nanofabrication. Recently a lot of research for the nanoimprint have been carried out, but almost are about merely experimental result relating to the material operation and the imprint fabrication, and numerical analysis relating to the understanding of the imprint process with R&D level. In this paper, the viscoelasticity analysis model is developed using the finite element method. With this model, the filling process and residual layer formation in nanoimprint are analyzed, which is evaluated by a nanoimprint experiment.

최근 나노임프린트 리소그래피 공정이 마이크로/나노 스케일의 소자 개발에 있어서 경제적으로 대량 생산할 수 있는 기술로 주목 받고 있다. 나노임프린트 공정에 대해서, 최근까지 수많은 연구가 이루어지고 있으나, 대부분 R&D 수준의 재료 및 제조와 관련된 실험적 결과 혹은 공정이해 수준의 수치해석적 연구에 그치고 있다. 본 연구에서는 유한요소법을 이용한 점탄성 해석모델을 완성하여 나노임프린트 공정의 충전과정 및 잔류층 형성을 해석하고, 패턴 전사 실험을 통하여 해석의 정확성을 검증하였다.

Keywords

References

  1. Chou, S.Y. and Krauss, P.R., "Imprint lithography with sub-100nm feature size and high throughput", Microelectronic Engineering, Vol.35, pp. 237-240, 1997. https://doi.org/10.1016/S0167-9317(96)00097-4
  2. Hong, S.H., Bae, B.J., Hwang, J.Y., Hwang, S.Y., Lee, H., "Replication of high ordered nano-sphere array by nanoimprint lithography", Microelectronic Engineering, Vol. 86, pp. 2423- 2426, 2009. https://doi.org/10.1016/j.mee.2009.05.005
  3. Guo, L.J., "Nanoimprint Lithography: Methods and Material Requirements", Advanced Materials, Vol.19, pp. 495-513, 2007. https://doi.org/10.1002/adma.200600882
  4. Kim, N.W., Kim, K.W., and Sin, H.-C., "A Viscoelastic Finite Element Analysis of Thermal Nanoimprint Lithogrphy Process", Journal of the Microelectronics & Packaging Society, Vol. 14, No.4, pp.. 1-7, 2007
  5. Lee, Y.H., Kim, N W., Sin, H.-C., " Effect of Boundary Slip Phenomena in Nanoimprint Lithography Process", Transactions of the Korean Society of Machine Tool Engineers, Vol. 18, No. 2, pp. 144-153, 2009.
  6. Zichao Song, "Study of Demolding Process in Thermal Imprint Lithography via Numerical Simulation and Experimental Approaches", M.S. Thesis, Louisiana State University 2007.
  7. ABAQUS User Manual

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