참고문헌
- 2001, Creighton, J.R. and Ho, P., "Introduction to Chemical Vapor Desposition," in Chemical Vapor Deposition (ed. by Park, J.H. and Sudarshan, T.S.), ASM International, http://www.asminternational.org.
- 1979, Schlichting, H., "Flow over a Rotating Disk", in Boundary Layer Theory, McGraw-Hill.
- 1997, Nakamura, S., "III-V Nitride Based Light Emitting Devices," Solid State Commun, Vol.102, No.2-3, pp.237-248. https://doi.org/10.1016/S0038-1098(96)00722-3
- 1999, Stringfellow, Organic Vapor-Phase Expitaxy: Theory and Practice, Academic Press, New York.
- 2000, Theodoropoulos, C., Mountziaris, T.J., Moffat, H.K., and Han, J., "Design of Gas Inlets for the Growth of Gallium Nitride by Metalorganic Vapor Phase Epitaxy," J. Crystal Growth, Vol.217, pp.65-81. https://doi.org/10.1016/S0022-0248(00)00402-4
- 2005, Sengupta, D., Nazumder, S., Kuykendall, W., and Lowry, S.A., "Cpmbined ab initio Quantum Chemistry and Computational Fluid Dynamics Calculations for Predictions of Gallium Nitride Growth," J. Crystal Growth, Vol.279, pp.369-382. https://doi.org/10.1016/j.jcrysgro.2005.02.036
- 1980, Pollard, R., and Newman, J., "Silicon Deposition on a Rotating Disk," J. Electrochem. Soc., Vol.127, No.3, pp.744-752. https://doi.org/10.1149/1.2129743
- 1982, Hitchman, M.L. and Curtis, B.J., "Heterogeneous Kinetic and Mass Transfer in Chemical Vaport Deposition. III. The Rotating Disc Reactor," J. Crystal Growth, Vol.60, pp.43-56. https://doi.org/10.1016/0022-0248(82)90171-3
- 1987, Evans, G. and Grief, R., "A Numerical Model of the Flow and Heat Transfer in a Rotating Disk Chemical Vapor Decomposition Reactor," Trans. ASME J. Heat Transfer, Vol.121, No.4, pp.774-788. https://doi.org/10.1115/1.2826066
- 1989, Patnaik, S., Brown, R.A., and Wang, C.A., "Hydrodynamic Dispersion in Rotating-Disk OMVPE Reactors: Numerical Simulation and Experimental Measurements," J. Crystal Growth, Vol.96, No.1, pp.153-174. https://doi.org/10.1016/0022-0248(89)90285-6
- 1992, Biber, C.R. and Wang, C.A., and Motakef, J., "Flow Regime Map and Deposition Rate Uniformity in Vertical Rotating-Disk OMVPE reactors," J. Crystal Growth, Vol.123, No.3-4, pp.545-554. https://doi.org/10.1016/0022-0248(92)90616-Q
- 2006, Mitrovic, B., Gurary, A., and Kadinski, L., "On the Flow Stability in Vertical Rotating Disc MOCVD Reactors under a Wide Range of Process Parameters," J. Crystal Growth, Vol.287, pp.656-663. https://doi.org/10.1016/j.jcrysgro.2005.10.131
- 2007, Mitrovic, B., Gurary, A., and Quinn, W., "Process Conditions Optimization for the Maximum Deposition Rate and Uniformity in Vertical Rotating Disc MOCVD Reactors Based on CFD Modeling," J. Crystal Growth, Vol.303, pp.323-329. https://doi.org/10.1016/j.jcrysgro.2006.11.247
- www.http://www.ansys.com/Products/Simulation+Technology/Fluid+Dynamics/ANSYS+Fluent
- 1993, Davies, R.W., Moore, E.F., and Zacharia, M.R., Numerical Modeling of Particle Dynamics in a Rotating Disk Chemical Vapor Deposition Reactor," J. Crystal Growth, Vol.132, pp.513-522. https://doi.org/10.1016/0022-0248(93)90079-C
- 1996, Thompson, A.G., Stall, R.A., Zawadzki, P., and Evans, G.H., "Scaling of CVD Rotating Disk Reactors to Large Sizes and Comparison with Theory," J. Electronic Mater., Vol.25, No.9, pp.1487-1494. https://doi.org/10.1007/BF02655388
피인용 문헌
- 회전원판형 CVD 장치의 유동 재순환을 억제하는 출구부 형상 설계를 위한 전산해석 vol.18, pp.4, 2012, https://doi.org/10.6112/kscfe.2013.18.4.074