The Transactions of The Korean Institute of Electrical Engineers (전기학회논문지)

The Korean Institute of Electrical Engineers (대한전기학회)
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The Characteristic and Formation of Ti(B,N) Films on Steel by EA Hot Filament CVD

EA hot filament CVD system을 이용하여 금형공구강에 증착한 Ti(B,N)박막의 합성과 특성에 관하여

  • 윤중현 (단국대 공대 신소재공학과) ;
  • 최용 (단국대 공대 신소재공학과) ;
  • 최진일 (단국대 공대 신소재공학과)
  • Received : 2011.12.26
  • Accepted : 2012.03.13
  • Published : 2012.04.01
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Abstract

The characteristics of interface layer and the effect of mole fraction of inlet gas mixture($B_2H_6/H_2/N_2/TiCl_4$) on the microstructure of Ti(B,N) films were studied by microwave plasma hot filament CVD process. Ti(B,N) films were deposited on a substrate(STD-61) to develop a high performance of resistance wear coating tool. Ti(B,N) films were obtained at a gas pressure of 1 torr, bias voltage of 300 V and substrate temperature of $480^{\circ}C$ in $B_2H_6/H_2/N_2/TiCl_4$gas system. It was found that TiN, $TiB_2$, TiB and hexagonal boron nitride(h-BN) phases exist in thin layer on the STD-61.

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