A Study on the Dielctric Properties of the PTC $BaTiO_3$ Ceramic Thin Films

  • Im, Ik-Tae (Dept. Mechanical Design Engineering, College of Eng., Chonbuk National University) ;
  • So, Byung Moon (Dept. IT Applied System Engineering, College of Eng., Chonbuk National University)
  • Received : 2012.09.03
  • Accepted : 2012.09.17
  • Published : 2012.09.30

Abstract

The films were deposited at evaporator system and were annealed at heat treatment. The films had a dense microstructure with fine grains. The electrical properties of the films were dramatically controlled with annealing. Samples Preparation were analyzed in term of positive temperature coefficient of Resistivity Samples were made in the substrate tempera-true of $400^{\circ}C$ deposition time of 10 hours, and forward power of 210watt. R-T(resistivity-temperature) Characteristics of the samples were investigated as a function of the substrate type and the ambient temperature. The resistivity of the thin film specimens was compared with that of the bulk type specimens. By using RF/DC magnetron sputtering system, we obtained lower resistivity in the thermistor with thin $BaTiO_3$ film than that in the bulk type thermistor.

Keywords

References

  1. Anderson, W.A.,"Electricaland Dielectric Properties of Thin Film $BaTiO_{3}$ Capacitors Deposited by Ratio Frequency Magnetron Sputtering". J. Vac. Sci. Technal.,A10(4), pp. 733-736, 1992
  2. Anderson, W.A.,"Effect of Barrier Layer on $BaTiO_{3}$ Thin Film Capacitors on Si Substrates". J. Elec. Mat., 23(1), pp. 53-56, 1994 https://doi.org/10.1007/BF02651267
  3. Shintani,Y, "Behaviors of High-Energy Electrons and Neutral Atom in the Sputtering of$BaTiO_{3}$ ", Jpn. J. Appl. Phy, 14(12), pp. 1875-1879,1975 https://doi.org/10.1143/JJAP.14.1875
  4. Felderman, C."Formation of Thin Films of $BaTiO_{3}$ by Evaporation", Rev. Sci. Instrum., 12(6), pp. 463- 466 1955.
  5. Dervies, R.C,"On the Preparation of the Single-Crystal Films of $BaTiO_{3}$ ", J. Am. Ceramic. Soc., 45, pp. 225- 228, 1962 https://doi.org/10.1111/j.1151-2916.1962.tb11132.x
  6. Shintani, Y. "Preparation of the$BaTiO_{3}$ Films by DC Diode Sputtering", J. Appl. Phys, 14, pp. 2376- 2380 1970
  7. Nagatomo, T.,"Fabrication of $BaTiO_{3}$ Films by Planar Magnetron Sputtering", Ferroelectrics, 37, pp.681- 684 1981 https://doi.org/10.1080/00150198108223520
  8. D.j.Qui, P.Yua., and H.Z. Wu, Solid State Commun, 134, 735, 2005 https://doi.org/10.1016/j.ssc.2005.03.028