반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
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레이저 간섭 리소그래피를 이용한 대면적 나노 구조체 제작

Large Area Nanostructure Fabrication by Laser Interference Lithography

  • 정일규 (한국생산기술연구원 미래융합연구그룹) ;
  • 김종석 (한국생산기술연구원 스마트시스템연구그룹) ;
  • 한재원 (연세대학교 기계공학과) ;
  • 이성호 (한국생산기술연구원 미래융합연구그룹)
  • Jeong, Il Gyu (Advanced Convergent Technology R&D Group, Korea Institute of Industrial Technology) ;
  • Kim, Jongseok (Smart System R&D Group, Korea Institute of Industrial Technology) ;
  • Hahn, Jae Won (School of Mechanical Engineering, Yonsei University) ;
  • Lee, Sung Ho (Advanced Convergent Technology R&D Group, Korea Institute of Industrial Technology)
  • 투고 : 2011.12.26
  • 심사 : 2012.02.29
  • 발행 : 2012.03.31
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초록

One dimensional and two dimensional nano patterns were fabricated on a 4-inch substrate by Laser Interference Lithography (LIL). Mach-Zehnder interferometer was setup to obtain the interference patterns and adjusted the pattern sizes with change of incident angle. We could obtain a periodic structure with a period of 440 nm using 266 nm laser, and demonstrated a pattern size with $293{\pm}25nm$ over a 4-inch substrate.

키워드

참고문헌

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