한국정밀공학회지 (Journal of the Korean Society for Precision Engineering)

  • 제28권8호
  • /
  • Pages.966-974
  • /
  • 2011
  • /
  • 1225-9071(pISSN)
  • /
  • 2287-8769(eISSN)
한국정밀공학회 (Korean Society for Precision Engineering)
권호 표지

집속이온빔을 이용한 마이크로/나노스케일에서의 실리콘 금형 가공 특성

The Characteristics of Focused Ion Beam Utilized Silicon Mold Fabrication on the Micro/Nano Scale

  • 김흥배 (한국생산기술연구원) ;
  • 노상래 (동서울대학 항공자동차기계공학부)
  • Kim, Heung-Bae (Korea Institute of Industrial Technology, KITECH) ;
  • Noh, Sang-Lai (Division of Aerospace, Automobile and mechanical engineering, Dong Seoul University)
  • 투고 : 2011.02.10
  • 심사 : 2011.06.07
  • 발행 : 2011.08.01
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

The use of ion beams in the micro/nano scale is greatly increased by technology development. Especially, focused ion beams (FIBs) have a great potential to fabricate the device in sub micro scale. Nevertheless, FIB has several limitations, surface swelling in low ion dose regime, precipitation of incident ions, and the redeposition effect due to the sputtered atoms. In this research, we demonstrate a way which can be used to fabricate mold structures on a silicon substrate using FIBs. For the purpose of the demonstration, two essential subjects are necessary. One is that focused ion beam diameter as well as shape has to be measured and verified. The other one is that the accurate rotational symmetric model of ion-solid interaction has to be mathematically developed. We apply those two, measured beam diameter and mathematical model, to fabricate optical lenses mold on silicon. The characteristics of silicon mold fabrication will be discussed as well as simulation results.

키워드

참고문헌

  1. Ivor, I. and Julius, J. M., "The Physics of Micro/Nano-fabrication," Plenum Press, 1992.
  2. Kaesmaier, R. and Loschner, H., "Ion Projection Lithography: Progress of European MEDEA & International Program," Microelectron. Eng., Vol. 53, No. 1, pp. 37-45, 2000. https://doi.org/10.1016/S0167-9317(00)00263-X
  3. Frey, L., Lehrer, C. and Ryssel, H., "Nanoscale Effects in Focused Ion Beam Processing," Appl. Phys. A, Vol. 76, No. 7, pp. 1017-1023, 2003. https://doi.org/10.1007/s00339-002-1943-1
  4. Vasile, M. J., Xie, J. and Nassar, R. J., "Depth control of focused ion-beam milling a numerical model of the sputtered process," J, Vac. Sci. Technol. B, Vol. 17, No. 6, pp. 3085-3090, 1999. https://doi.org/10.1116/1.590959
  5. Tseng, A. A., "Recent Developments in Micromilling using Focused Ion Beam Technology," J. Micromech. Microeng., Vol. 14, No. 4, pp. R15-R34, 2004. https://doi.org/10.1088/0960-1317/14/4/R01
  6. Orloff, J., "Handbook of Charged Particle Optics," CRC Press, Boca Raton, pp. 129-160, 2009.
  7. Kim, H. B., Hobler, G., Steiger, A., Lugstein, A. and Bertagnolli, E., "Level set approach for the simulation of focused ion beam processing on the micro/nano scale," Nanotechnology, Vol. 18, No. 26, pp. 265307-265313, 2007. https://doi.org/10.1088/0957-4484/18/26/265307
  8. Kim, H. B., Hobler, G., Steiger, A., Lugstein, A. and Bertagnolli, E., "Full three-dimensional simulation of focused ion beam micro/nanofabrication," Nanotechnology, Vol. 18, No. 24, pp. 245303-245311, 2007. https://doi.org/10.1088/0957-4484/18/24/245303
  9. Orloff, J., "Handbook of Charged Particle Optics," CRC Press, pp. 549-552, 2009.
  10. Ward, J. W., Utlaut, M. W. and Kubena, R. L., "Computer simulation of current density profiles in focused ion beams," J. Vac. Sci. Technol. B, Vol. 5, No. 1, pp. 169-174, 1987. https://doi.org/10.1116/1.583856
  11. Harriott, L. R., "Beam-size measurement in focused ion beam systems," J. Vac. Sci. Technol. A, Vol. 8, No. 2, pp. 899-901, 1990. https://doi.org/10.1116/1.576893
  12. Ben Assayag, G., Vieu, C., Gierak, J., Sudraud, P. and Corbin, A., "New characterization method of ion current-density profile based on damage distribution of $Ga^+$ focused-ion beam implantation in GaAs," J. Vac. Sci. Technol. B, Vol. 11, No. 6, pp. 2420-2426, 1993. https://doi.org/10.1116/1.586998
  13. Lugstein, A., Basner B., Hobler, G. and Bertagnolli, E., "Current density profile extraction of focused ion beams based on atomic force microscopy contour profiling of nanodots," J. Appl. Phys., Vol. 92, No. 7, pp. 4027-4042, 2002.
  14. Patterson, N., Adams, D. P., Hodges, V. C., Vasile, M. J., Michael, J. R. and Kotula, P. G., "Controlled fabrication of nanopores using a direct focused ion beam approach with back face particle detection," Nanotechnology, Vol. 19, No. 23, pp. 235304-235313, 2008. https://doi.org/10.1088/0957-4484/19/23/235304
  15. Fu, Y. and Bryan, N., "Fabrication of threedimensional microstructures by two-dimensional slice by slice approaching via focused ion beam milling," J. Vac. Sci. Technol. B, Vol. 22, No. 4, pp. 1672-1678, 2004. https://doi.org/10.1116/1.1761460
  16. Lee, H. W., Han, J., Min, B. K. and Lee, S. J., "Simulation of focused ion beam processes for micronano machining," Journal of the Korean Society for Precision Engineering, Vol. 25, No. 3, pp. 44-49, 2008.