Journal of Advanced Marine Engineering and Technology

  • 제35권3호
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  • Pages.323-328
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  • 2011
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  • 2234-7925(pISSN)
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  • 2234-8352(eISSN)
한국마린엔지니어링학회 (The Korean Society of Marine Engineering)
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Formation of SiO:CH Ultra Water Repellent Thin Films by Inductively Coupled RF PECVD

  • Yun, Yong-Sup (Division of Marine System Engineering, Korea Maritime University)
  • 투고 : 2011.03.10
  • 심사 : 2011.05.23
  • 발행 : 2011.05.31
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초록

In this paper, the UWR thin films were prepared by RF PECVD. The relationships between the deposition conditions and the film properties such as morphological and chemical properties of the films were discussed. Moreover, from the analysis of plasma diagnostics using OES, formation mechanism of UWR thin films was discussed.

키워드

참고문헌

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피인용 문헌

  1. Analysis of nano-cluster formation in the PECVD process vol.37, pp.2, 2013, https://doi.org/10.5916/jkosme.2013.37.2.144