References
- Okazaki, S., "Comparison of Optical, X-ray, Electron, and ion beam Lithography," Microelectronics Engineering, Vol. 9, No. 1-4, pp. 297-304, 1989. https://doi.org/10.1016/0167-9317(89)90068-3
- Gierak, J., Mailly, D., Faini, G., Pelouard, J. L., Denk, P., Pardo, F., Marzin, J. Y., Septier, A., Schmid, G., Ferre, J., hydamn, R., Chappert, C., Flicstein, J., Gayral, B. and Gerard, J. M., "Nano-fabrication with focused ion beams," Microelectronic Engineering, Vol. 57-58, pp. 865-875, 2001.
- Choi, Y. S., Kim, T. G., Min, B. K. and Kim, Y. J., "Evaluation of durability and etching rate of material of the Multi-aperture plate for Multi-FIB," Proc. of KSPE Spring Conference, pp. 929-930, 2009.
- Bruenger, W. H., Kaesmaier, R., Loeshner, H. and Springer, R., "Status of Ion Projection Lithography," Proc. of Mat. Res. Soc. Symp., Vol. 636, Paper No. D5.5, 2001.
- Jiang, X. Q., Chang, J. A. and Leung, K. N., "Mini rfdriven ion sources for focused ion beam systems," Rev. Sci. Instrum., Vol. 74, No. 4, pp. 2288-2292, 2003. https://doi.org/10.1063/1.1556944
- Salancon, E., Hammadi, Z. and Morin, R., "A new approach to gas field ion sources," Ultramicroscopy, Vol. 95, No. 1-4, pp. 183-188, 2003. https://doi.org/10.1016/S0304-3991(02)00315-7
- Guharay, S. K., Sokolovsky, E. A., Reiser, M., Orloff, J. and Melngailis, J., "Study of energy broadening of high-brightness ion beams from a surface plasma Penning source and its relevance in ion projection lithography," Microelectronic Engineering, Vol. 35, No. 1-4, pp. 435-438, 1997. https://doi.org/10.1016/S0167-9317(96)00179-7
- Choi, S. C. and Han J. K., "Surface Modification of polymer and Metal by Ion Beam or Plasma," J. Kor. Soc. Prec. Eng., Vol. 25, No. 3, pp. 32-43, 2008.
- Gavrilov, N. V., Mesyats, G. A., Radkovski, G. V. and Bersenev, V. V., "Development of technological sources of gas ions on the basis of hollow-cathode glow discharge," Surface and Coatings Technology, Vol. 96, No. 1, pp. 81-88, 1997. https://doi.org/10.1016/S0257-8972(97)00096-0
- Remy, J., Biennier, L. and Salama, F., "Plasma structure in a pulsed discharge environment," Plasma Source Sci. Technol., Vol. 12, No. 3, pp. 295-301, 2003. https://doi.org/10.1088/0963-0252/12/3/301
- Boonyawan, D., Suanpoot, P. and Vilaithong, T., "A 13.56 MHz multicusp ion source for gaseous ionbeam production," Surface and Coating Technology, Vol. 112, No. 1-3, pp. 314-317, 1999. https://doi.org/10.1016/S0257-8972(98)00742-7
- Wutte, D., Freedman, S., Gough, R., Lee, Y., Leitner, M., Leung, K. N., Lyneis, C., Pickard, D. S., Williams, M. D. and Xie, Z. Q., "Development of an rf driven multicusp ion source for nuclear science experiments," Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 142, No. 3, pp. 409-416, 1998. https://doi.org/10.1016/S0168-583X(98)00221-3