한국군사과학기술학회지 (Journal of the Korea Institute of Military Science and Technology)

  • 제14권6호
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  • Pages.1107-1113
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  • 2011
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  • 1598-9127(pISSN)
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  • 2636-0640(eISSN)
한국군사과학기술학회 (The Korea Institute of Military Science and Technology)
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이온빔 기술 리뷰

A Review of Ion Beam Technology

  • 이태호 (한국과학기술정보 연구원 ReSeat 프로그램)
  • 투고 : 2011.10.02
  • 심사 : 2011.11.25
  • 발행 : 2011.12.05
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초록

In this paper, ion beam technology was investigated through the published papers. Ion beam technology is mainly used by the focused ion beams. There are two different types of application methods. One method is to remove the material from the substrate, the other one is to deposit the materials on the surface of the substrate or specimen. Based on the literature review there are 1.5 times more published research papers related to the deposition than those of the removal.

키워드

참고문헌

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  2. V. E. Krohn and G. R. Ringo, "Ion Source of High Brightness using Liquid Metal", Applied Physics Lett, 27. pp. 479-518, 1975. https://doi.org/10.1063/1.88540
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  6. Vladimir Matias, et al, "Coated Conductors Textured by Ion Beam Assisted Deposition", Physica C 460-462, pp. 312-315, 2007. https://doi.org/10.1016/j.physc.2007.03.357
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  16. http://en.wikipedia.org/wiki/Anti-reflective_coating#Index-matching(무반사 코팅).
  17. http://www.fabtech.org/images/uploads/Companies/Carl_Zeiss/zeiss_9_him_column_300.gif.
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