Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
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Fabrication of Functional ZnO Nano-particles Dispersion Resin Pattern Through Thermal Imprinting Process

ZnO 나노 입자 분산 레진의 thermal imprinting 공정을 통한 기능성 패턴 제작

  • Kwon, Moo-Hyun (Department of Applied Chemistry, Woosuk Univ.) ;
  • Lee, Heon (Department of Materials Science and Engineering, Korea Univ.)
  • 권무현 (우석대학교 응용화학과) ;
  • 이헌 (고려대학교 신소재공학과)
  • Received : 2011.11.01
  • Accepted : 2011.11.11
  • Published : 2011.12.01
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Abstract

Nanoimprint lithography is a next generation lithography technology, which enables to fabricate nano to micron-scale patterns through simple and low cost process. Nanoimprint lithography has been applied in various industry fields such as light emitting diodes, solar cells and display. Functional patterns, including anti-reflection moth-eye pattern, photonic crystal pattern, fabricated by nanoimprint lithography are used to improve overall efficiency of devices in that fields. For these reasons, in this study, sub-micron-scaled functional patterns were directly fabricated on Si and glass substrates by thermal imprinting process using ZnO nano-particles dispersion resin. Through the thermal imprinting process, arrays of sub-micron-scaled pillar and hole patterns were successfully fabricated on the Si and glass substrates. And then, the topography, components and optical property of the imprinted ZnO nano-particles/resin patterns are characterized by Scanning Electron Microscope, Energy-dispersive X-ray spectroscopy and UV-vis spectrometer, respectively.

Keywords

References

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