공업화학 (Applied Chemistry for Engineering)

  • 제21권6호
  • /
  • Pages.694-696
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  • 2010
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  • 1225-0112(pISSN)
  • /
  • 2288-4505(eISSN)
한국공업화학회 (The Korean Society of Industrial and Engineering Chemistry)
권호 표지

용액 공정을 통한 도핑된 실리콘 나노입자의 합성과 특성

Synthesis and Characterization of Doped Silicon Nanoparticles by a Solution Route

  • 권하영 (한국생산기술연구원 청정생산기술연구부) ;
  • 임은희 (한국생산기술연구원 청정생산기술연구부) ;
  • 이성구 (한국생산기술연구원 청정생산기술연구부) ;
  • 이경균 (한국생산기술연구원 청정생산기술연구부)
  • Kwon, Ha-Young (Green Chemistry & Manufacturing System Division, Korea Institute of Industrial Technology (KITECH)) ;
  • Lim, Eun-Hee (Green Chemistry & Manufacturing System Division, Korea Institute of Industrial Technology (KITECH)) ;
  • Lee, Sung-Koo (Green Chemistry & Manufacturing System Division, Korea Institute of Industrial Technology (KITECH)) ;
  • Lee, Kyeong-K. (Green Chemistry & Manufacturing System Division, Korea Institute of Industrial Technology (KITECH))
  • 투고 : 2010.08.27
  • 심사 : 2010.10.04
  • 발행 : 2010.12.10
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초록

용액공정을 이용하여 표면에 알킬기를 도입하고, 붕소(boron) 또는 인(phosphorous)으로 도핑된 실리콘 나노 입자를 합성하였다. 나노 입자의 합성 여부 및 입자크기는 핵자기공명분광기(NMR), 적외선분광기(FT-IR), 자외선가시광선분광기(UV-Vis), 인광분광기(PL)를 이용하여 분석하였다. 마이크로웨이브 소결기를 이용하여 표면의 알킬기를 제거하고, 결정성을 갖는 필름을 제작하였다. 필름의 조각은 $200{\mu}m$ 정도의 크기를 가지며 큐빅구조를 가지고 있다는 것을 전자주사현미경(FE-SEM)과 투과전자현미경(FR-TEM)으로 확인할 수 있었다. 필름의 전도도는 도핑 타입을 통해 조절할 수 있었다.

We have synthesized boron (or phosphorous) doped silicon nanoparticles (Si-NPs) by a solution process. The surfaces of the Si-NPs were terminated with various alkyl groups to form a protecting layer. The Si-NPs were characterized by UV-Vis, PL, FTIR, and NMR. Through a microwave sintering process, the crystalline thin films of the Si-NPs were prepared by removing the surface alkyl groups. The TEM and SEM images reveal that contiguous films as large as $200{\mu}m$ in diameter were formed with a cubic structure. The electrical conductivity of the Si film was controlled by a doping type.

키워드

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