열처리공학회지 (Journal of the Korean Society for Heat Treatment)

  • 제23권1호
  • /
  • Pages.29-33
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  • 2010
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  • 1225-1070(pISSN)
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  • 2508-4046(eISSN)
한국열처리공학회 (The Korean Society for Heat Treatment)
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전자-빔 조사를 이용한 TiN 박막의 물성변화에 관한 연구

A Study on the Properties of TiN Films by Using Electron Beam Irradiation

  • 신창호 (울산대학교 첨단소재공학부) ;
  • 성영종 ((주)DH 기술연구소) ;
  • 임성열 ((주)DH 기술연구소) ;
  • 신기욱 ((주)DH 기술연구소) ;
  • 정철우 (울산대학교 첨단소재공학부) ;
  • 김선광 (울산대학교 첨단소재공학부) ;
  • 김준호 (울산대학교 첨단소재공학부) ;
  • 유용주 (울산대학교 첨단소재공학부) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Shin, C.H. (School of Materials Science and Engineering, University of Ulsan) ;
  • Sung, Y.J. (DH Co., Ltd) ;
  • Lim, S.Y. (DH Co., Ltd) ;
  • Shin, G.W. (DH Co., Ltd) ;
  • Jeong, C.W. (School of Materials Science and Engineering, University of Ulsan) ;
  • Kim,, S.K. (School of Materials Science and Engineering, University of Ulsan) ;
  • Kim, J.H. (School of Materials Science and Engineering, University of Ulsan) ;
  • You, Y.Z. (School of Materials Science and Engineering, University of Ulsan) ;
  • Kim, Dae-Il (School of Materials Science and Engineering, University of Ulsan)
  • 투고 : 2010.01.04
  • 심사 : 2010.01.18
  • 발행 : 2010.01.30
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초록

Titanium nitride (TiN) films were deposited on the polycarbonate substrate by using radio frequency (RF) magnetron sputtering without intentional substrate heating. After deposition, the films were bombarded with intense electron beam for 20 minutes. The intense electron irradiation impacts on the crystalline, hardness and surface roughness of the TiN films. The films irradiated with an electron beam of 300 eV show the small grains on the surface, while as deposited TiN films did not showany grains on the surface. Also the surface harness evaluated with micro indenter was increased up to 18 Gpa at electron energy of 900 eV after electron beam irradiation. In addition, surface root mean square (RMS) roughness of the films irradiated with intense electron beam affected strongly. The films irradiated by electron beam with 900 eV have the lowest roughness of 1.2 nm in this study.

키워드

참고문헌

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피인용 문헌

  1. Properties of TiN Films Fabricated through Post-deposition Electron Beam Irradiation vol.29, pp.4, 2010, https://doi.org/10.7735/ksmte.2020.29.4.305
  2. Titanium Aluminium Nitride 후막의 전자-빔 조사 효과 vol.53, pp.6, 2010, https://doi.org/10.5695/jkise.2020.53.6.280