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A Study on the Properties of AZO Films Surface-annealed by RF Magnetron Sputtering and Electron Beam Radiation

전자빔 조사에 의해 표면열처리된 AZO 박막의 물성변화에 관한 연구

  • Shin, Chang-Ho (School of Materials Science and Engineering, University of Ulsan) ;
  • Jeong, Cheol-Woo (School of Materials Science and Engineering, University of Ulsan) ;
  • Kim, Yu-Sung (New optics Ltd. R&D division) ;
  • Chae, Ju-Hyun (New optics Ltd. R&D division) ;
  • Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
  • 신창호 (울산대학교 첨단소재공학부) ;
  • 정철우 (울산대학교 첨단소재공학부) ;
  • 김유성 ((주)뉴옵틱스 공정연구소) ;
  • 채주현 ((주)뉴옵틱스 공정연구소) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Received : 2010.07.01
  • Accepted : 2010.07.13
  • Published : 2010.07.30

Abstract

Transparent and conductive AZO films were deposited on the glass by using radio frequency (RF) magnetron sputtering with intense electron radiation, simultaneously. After deposition, the effect of electron radiation energy on the optical and electrical properties of AZO was investigated. In XRD measurements, the films irradiated with intense electron beam show the larger grain size than that of the films prepared without electron radiation. Sheet resistance was also dependent on the electron radiation energy, while the optical transmittance in visible wavelength region was not affected seriously by electron radiation. X-.ray diffraction, UV-Vis spectrophotometer and four point probes were used to observe the crystallization, optical transmittance and sheet resistance, respectively.

Keywords

References

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