DOI QR코드

DOI QR Code

Electrical Instabilities of Mesoporous Silica Thin Films

  • Dung, Mai Xuan (Department of Chemistry and Institute of Basic Science, Chonnam National University) ;
  • Jeong, Hyun-Dam (Department of Chemistry and Institute of Basic Science, Chonnam National University)
  • Received : 2010.12.07
  • Accepted : 2010.12.23
  • Published : 2010.12.31

Abstract

On the surface of mesoporous silica thin films (MSTF) which were fabricated by sol-gel approach there are existences of water and three different silanol types including chained, germinal and isolated silanol. Their amounts changes as a function of aging time of used sol solution, as confirmed by FT-IR. The adsorbed water generates ionic carriers such as H+ and OH- and passivates the Si dangling bonds at the interface of silicon wafer-MSTF. The ionic carriers can not only transport across the thickness of thin film to enhance the leakage current but also diffuse toward the silicon wafer-MSTF interface to depassivate Si dangling bonds. On the other hand, chained silanols or germinal silanols promote the moisture adsorption of MSTF and tend to form strongly hydrogen bonded systems with adsorbed water molecules resulting in very high dielectric constant. Isolated silanol, on the contrary, affects less on electrical properties of thin film.

Keywords

References

  1. G. Q. Lu and X. S. Zhao, "Nanoporous Materials Science and Engineering", Imperial College Press, London, p. 1, 2003.
  2. T. C. Chang, C. W.Chen, P. T. Liu, Y. S. Mor, H. M. Tsai, T. M. Tsai, S. T. Yan, C. H. Tu, T. Y. Tseng, and S. M. Sze, "Moisture-Induced Material Instability of Porous Organosilicate Glass", Electrochem. Solid-State Lett. Vol. 6, p. 13, 2003.
  3. Y. Uchida, S. Hishiya, N. Fujii, K. Kohmura, T. Nakayama, H. Tanaka, and T. Kikkawa, "Effect of moisture adsorption on the properties of porous-silica ultralow-k films", Microelectron. Eng., Vol. 83, p. 2126, 2006. https://doi.org/10.1016/j.mee.2006.09.018
  4. A. P. Singh, P. Victor, P. G. Ganesan, O. Nalamasu, and G. Ramanath, "Moisture-induced capacitancevoltage instabilities in mesoporous silica thin films", Appl. Phys. Lett., Vol. 87, p.3506, 2005.
  5. H. Miyoshi, K. Yamada, K. Kohmura, N. Fujii, H. Matsuo, H. Tanaka, Y. Oku, Y. Seino, N. Hata, and T. Kikkawa, "Semiconductors-Theoretical Investigation of Dielectric Constant and Elastic Modulus of Three-Dimensional Isotropic Porous Silica Films with Cubic", Jpn. J. Appl. Phys., Vol. 44, p. 5982, 2005. https://doi.org/10.1143/JJAP.44.5982
  6. H. Miyoshi, H. Matsuo, Yo. Oku, H. Tanaka, K. Yamada, N. Mikami, S. Takada, N. Hata, and T. Kikkawa, "Theoretical Analysis of Elastic Modulus and Dielectric Constant for Lowk Two-Dimensional Periodic Porous Silica Films", Jpn. J. Appl. Phys., Vol. 43, p. 498, 2004. https://doi.org/10.1143/JJAP.43.498
  7. H. Miyoshi, No. Hata, and T. Kikkawa, "Theoretical Investigation of Dielectric Constant and Elastic Modulus of Two-Dimensional Periodic Porous Silica Films with Elliptical Cylindrical Pores", Jpn. J. Appl. Phys., Vol. 44, p. 1166, 2005. https://doi.org/10.1143/JJAP.44.1166
  8. I. Fisher, W. D. Kaplan, and M. Eizenberg, "Prediction of Survival in Follicular Lymphoma Based on Molecular Features of Tumor-Infiltrating Immune Cells", J. Appl. Phys., Vol. 95, p. 5762, 2004. https://doi.org/10.1063/1.1699491
  9. S. Yu, T. K. S. Wong, X. Hu, and K. Pita, "Sol-gel derived mesoporous silica films used as low dielectric constant materials", Thin Solid Films, Vol. 462, p. 311, 2004. https://doi.org/10.1016/j.tsf.2004.05.029
  10. J. T. Luo, W. F. Wu, H. C. Wen, B. Z. Wan, Y. M. Chang, C. P. Chou, J. M. Chen, and W. N. Chen, "The roles of hydrophobic group on the surface of ultra low dielectric constant porous silica film during thermal treatment", Thin Solid Films, Vol. 515, p. 7275, 2007. https://doi.org/10.1016/j.tsf.2007.03.028
  11. S. Yang, P. A. Mirau, C. S. Pai, O. Nalamasu, E. Reichmanis, E. K. Lin, H. J. Lee, D. W. Gidley, and J. Sun, "Molecular Templating of Nanoporous Ultralow Dielectric Constant (${\approx}1.5$) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers", Chem. Mater., Vol. 13, p. 2762, 2001. https://doi.org/10.1021/cm0102786
  12. D. Grosso, F. Cagnol, G. J. A. A. Soler-Illia, E. L. Crepaldi, H. Amenistsch, A. Brunet-Bruneau, A. Bourgeois, and C. Shanchez, "Fundamentals of Mesostructuring Through Evaporation-Induced Self-Assembly", Adv. Funct. Mater., Vol. 14, p. 310, 2004.
  13. P. Innocenzi, "Infrared spectroscopy of sol-gel derived silica-based films: a spectra-microstructure overview", J. Non-Cryst. Solids, Vol. 316, p. 309, 2003. https://doi.org/10.1016/S0022-3093(02)01637-X
  14. D. H. Lee and H. D. Jeong, "Distinct clockwise capacitance-voltage hysteresis in aminopropyl- silsesquioxane thin films", J. Phys. Chem. C , Vol. 112, p. 16984, 2008. https://doi.org/10.1021/jp804636e
  15. C. S. Kim and H. D. Jeong, "What originates the dielectric permittivity of silicate-silsesquioxane hybrid thin films?", J. Phys. Chem. B, Vol. 112, p. 16257, 2008. https://doi.org/10.1021/jp808529q
  16. R. A. B. Devine, G. V. Herrera, "Electric-fieldinduced transport of protons in amorphous $SiO_2$", Phys. Rev., B, Vol. 63, p. 3406, 2001.
  17. L. Bollmann, V. N. Urade, and H. W. Hillhouse, "Controlling Interfacial Curvature in Nanoporous Silica Films Formed by Evaporation-Induced Self- Assembly from Nonionic Surfactants. II. Effect of Processing Parameters on Film Structure", Langmuir, Vol. 23, p. 4257, 2007. https://doi.org/10.1021/la0626407
  18. V. N. Urade, L. Bollmann, J. D. Kowalski, M. P. Tate, and H. W. Hillhouse, "Controlling Interfacial Curvature in Nanoporous Silica Films Formed by Evaporation- Induced Self-Assembly from Nonionic Surfactants. II. Effect of Processing Parameters on Film Structure", Langmuir, Vol. 23, p. 4268, 2007. https://doi.org/10.1021/la062641z