Journal of the Korean Society of Manufacturing Technology Engineers (한국생산제조학회지)

The Korean Society of Manufacturing Technology Engineers (한국생산제조학회)
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Development of a LDI System for the Maskless Exposure Process and Energy Intensity Analysis of Single Laser Beam

Maskless 노광공정을 위한 LDI(Laser Direct Imaging) 시스템 개발 및 단일 레이저 빔 에너지 분포 분석

  • Received : 2010.09.15
  • Accepted : 2010.10.19
  • Published : 2010.12.15
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Abstract

Photo lithography process is very important technology to fabricate highly integrated micro patterns with high precision for semiconductor and display industries. Up to now, mask type lithography process has been generally used for this purpose; however, it is not efficient for small quantity and/or frequently changing products. Therefore, in order to obtain higher productivity and lower manufacturing cost, the mask type lithography process should be replaced. In this study, a maskless lithography system using the DMD(Digital Micromirror Device) is developed, and the exposure condition and optical properties are analyzed and simulated for a single beam case. From the proposed experimental conditions, required exposure experiments were preformed, and the results were investigated. As a results, 10${\mu}m$ spots can be generated at optimal focal length.

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References

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