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권순일, 양계준, 송우창, 임동건, “
$SF_6,\;C_4F_8,\;O_2$ 가스변화에 따른 실리콘 식각율과 식각 형태 개선”, 전기전자재료학회논문지, 21권, 4호, p. 305, 2008. https://doi.org/10.4313/JKEM.2008.21.4.305
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