WC-Co 공구의 이온 주입에 따른 표면층 및 가공된 표면거칠기 특성

Characteristics of Machined Surface Roughness and Surface Layers of WC-Co Tools with Plasma Source Ion Implantation

  • 강성기 (한국폴리텍VII대학 컴퓨터응용기계설계과) ;
  • 김영규 (경남대학교 대학원 기계공학과) ;
  • 왕덕현 (경남대학교 기계자동화공학부) ;
  • 전영록 (경남대학교 기계자동화공학부) ;
  • 김원일 (경남대학교 기계자동화공학부)
  • 투고 : 2009.12.28
  • 심사 : 2010.02.23
  • 발행 : 2010.02.28

초록

The most suitable condition for plasma source ion implantation(PSII) was found based on the study of the characteristics of PSIIed tool and machined surfaces. The depth analysis according to the chemical bonding state of elements and surface component elements through the XPS and SIMS, was conducted to find the improved property of the PSIIed surface. Due to the diffusion of PSII, the nitrogen was found up to a depth of about 150nm according to the supplied voltage and ion implanted time. The deep diffusion by nitrogen caused the surface modification, but the formation of oxide component was found due to the residual gas contamination on the surface. Statistical method of ANOVA was conducted to find the effects of spindle speed and feed rate in interaction for machined surface roughness with PSIIed tools. The surface modification was found largely occurred by the nitrogen implanted surface with 2 hours for 27kV, 35kV and 43kV.

키워드

과제정보

연구 과제 주관 기관 : 경남대학교

참고문헌

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