전기학회논문지P (The Transactions of the Korean Institute of Electrical Engineers P)

  • 제59권4호
  • /
  • Pages.423-427
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  • 2010
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  • 1229-800X(pISSN)
  • /
  • 2586-7792(eISSN)
대한전기학회 (The Korean Institute of Electrical Engineers)
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Dual-Configuration Four-Point Probe Method에 의한 휴대형 면저항 측정기 개발

Development of Hand-Held Type Sheet Resistance Meter Based on a Dual-Configuration Four-Point Probe Method

  • 투고 : 2010.06.08
  • 심사 : 2010.09.14
  • 발행 : 2010.12.01
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초록

Portable sheet resistance-measuring instrument using the dual-configuration Four-Point Probe method is developed for the purpose of precisely measuring the sheet resistance of conducting thin films. While single-configuration Four-Point Probe method has disadvantages of applying sample size, shape and thickness corrections for a probe spacing, the developed instrument has advantages of no such corrections, little edge effects and measuring simply and accurately the sheet resistance between $0.2\Omega/sq$ and $2k\Omega/sq$.

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참고문헌

  1. Arther Uhlir, JR. "The Potentials of Infinite Systems of Sources and Numerical Solutions of Problems in Semiconductor Engineering", Bell System Technical Journal, Vol. 34, No. 1, pp. 105-128, 1954.
  2. L. B. Valdes, "Resistivity Measurements on Germanium for Transistors", Proceedings of the Institute of Radio Engineers New York"., Vol. 42, pp. 420-427, Feb., 1954.
  3. F. M. SMITS, "Measurement of Sheet Resistivities with the Four-Point Probe", Proceedings of the Institute of Radio Engineers, pp 711-718, May 1958.
  4. ASTM F84, "Test Method for Measuring Resistivity of Silicon Wafers with In-Line Four-Point Probe"
  5. Lydon J. Swartzendruber, "Correction Factor Tables for Four-Point Probe Resistivity Measurements on Thin, Circular Semiconductor Samples", NBS technical note 199, April 1964.
  6. ASTM F1529-97, "Standard Test Method for Sheet Resistance Uniformity Evaluation by In-Line Four-Point Probe with the Dual-Configuration Procedure", 1997.
  7. J. R. Ehrstein and M. C. Crparlom, NIST Special Publication 260-131, 1999. (The Certification of 100 mm Diameter Silicon Resistivity SRMs 2541 through 2547 Using Dual-Configuration Four-Point Probe Measurements.)
  8. Masato YAMASHITA, "Resistivity Measurement by Dual-Configuration Four-Probe Method". The Japan Society of Applied Physics, Vol. 42, No. 2A, pp 695-699, February 2003. https://doi.org/10.1143/JJAP.42.695
  9. ISO "Guide to the Expression of Uncertainty in Measurement", 1991.
  10. EA-4/02, "Expression the uncertainty of measurement in calibration", 1999.
  11. KRISS-99-079-ET, "측정불확도 평가 및 표현방법", 1999.