반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

$Ar/O_2$비에 따른 $Sr_{0.7}Bi_{2.3}Nb_2O_9$ 박막의 구조 및 영향

Structure and Influence of $Sr_{0.7}Bi_{2.3}Nb_2O_9$ Thin Film with $Ar/O_2$ Ratio

  • 김진사 (조선이공대학 메카트로닉스과) ;
  • 최운식 (대불대학교 기술교육과)
  • Kim, Jin-Sa (Dept. of Mechatronics, Chosun College University of Science & Technology) ;
  • Choi, Woon-Shik (Dept. of Technology Education, Daebul University)
  • 발행 : 2009.06.30
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초록

The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/$SiO_2$/Si) using RF sputtering method at various $Ar/O_2$ ratio. We investigated the effect of deposition condition(specially $Ar/O_2$ ratio) on the structural properties of SBN thin film. As $Ar/O_2$ ratio was increased, the peaks in the XRD pattern became more sharp. Also, the peaks(008)(115)(220) in 80/20 of $Ar/O_2$ ratio were suddenly appeared. The optimum of the rougness showed about 4.33 nm in 70/30 of $Ar/O_2$ ratio. The crystallinity of SBN thin films were increased with the increase of $Ar/O_2$ ratio. Also, Deposition rate of SBN thin films was about 4.17 nm/min in 70/30 of $Ar/O_2$ ratio. The capacitance of SBN thin films were increased with the increase of $Ar/O_2$ ratio.

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참고문헌

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