참고문헌
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J.S.Hong, B.R.Rhee, H.M.Kim, K.C.Je, Y.J.Kang, J.S.Ahn, “Enhanced properties of In
$_{2}O_{3}$ –ZnO thin films deposited on soda lime glass due to barrier layers of SiO2 and TiO2”, Thin Solid Films, 467,158, pp.158-161, 2004. https://doi.org/10.1016/j.tsf.2004.03.014 - Z.H.Huang, X.T.Zeng, X.Y.Sun, E.T.Kang, Jerry Y.H.Fuh, L.Lu, “Influence of electrochemical treatment of ITO surface on nucleation and growth of OLED hole transport layer”, Thin Solid Films, 517, 17, pp.4810-4813, 2009. https://doi.org/10.1016/j.tsf.2009.03.020
- K.H.Kim, “The preparation of indium tin oxide films as a function of oxygen gas flow rate by a facing target sputtering system”, Journal of Ceramic Processing Research, 8, 1, p19, 2007.
- Y.S.Rim, S.M.Kim, K.H.Kim, “Effects of Substrate Heating and Film Thickness on Properties of Silver-Based ZnO Multilayer Thin Films”, Japanese Journal of Applied Physics, 47, 16, 2008.
- S.M.Kim, Y.S.Rim, M.J.Keum, K.H.Kim, “Study on the electrical and optical properties of ITO and AZO thin film by oxygen gas flow rate”, Journal of electroceramics, DOI 10.1007/s10832-008-9452-z, 2008.
- T.Minami, T. yamamoto, Y.Toda, T.Miyata, “ Trnasparent conducting zinc-co-doped ITO films prepared by magnetron sputtering”, Thin solid Films, 373, pp.189-194, 2000. https://doi.org/10.1016/S0040-6090(00)01132-9
- Y.S. Jung, J.Y.Seo, D. W. Lee, D.Y. Jeon, “Influence of DC magnetron sputtering parameters on the properties of amorphous indium zincoxide thin film”, Thin Solid Films, 445, pp.63-71, 2003. https://doi.org/10.1016/j.tsf.2003.09.014
- H.H.Shin, S.J.Kang, Y.S.Yoon, “Optical properties of Al-doped ZnO thin films with various Al doping concentrations and annealing temperatures”, Journal of the Korean Institute of Electronics, 30, 1, pp887-888, 2007.
- N.O.Kim, H.G.Kim, W.S.kim, “Optical and electrical properties of B-FeSi2 single crystals”, Journal of the Korean Institute of Electrical and Electronic Material Engineering, 14, 8, pp.618-621, 2001.
- Z.H.Huang, X.T.Zeng, X.Y.Sun, E.T.Kang, J.Y.H.Fuh, L.Lu, “Influence of electrochemical treatment of ITO surface on nucleation and growth of OLED hole layer,” Thin Solid Films, 517, pp.4810-4813, 2009. https://doi.org/10.1016/j.tsf.2009.03.020
- G.Liu, J.B.Kerr, S.Johnson, “Dark spot formation relative to ITO surface roughness for polyfluorene devices”, Synthetic Metals, 144, 1, pp.1-6, 2004. https://doi.org/10.1016/j.synthmet.2004.01.011
- B.Zhang, X.Dong, X.Xu, X.wang, J.Wu, “Electrical and optical properties of ITO and ITO:Zr transparent conducting films” Material Science in Semiconductor Processing, 10, 6, pp.264-269, 2007. https://doi.org/10.1016/j.mssp.2008.03.003
- J.H.Bae, H.K.Kim, “Characteristics of Al doped ZnO co-sputtered InZnO anode films prepared by direct current magnetron sputtering for organic light-emitting diodes”, Thin Solid Film, 516, 21, pp.7866-7870, 2008. https://doi.org/10.1016/j.tsf.2008.05.035
- H.Mu, W.Li, R.Jones, A.Steckl, D.Klotzkin, “A comparative study of electrode effects on the electrical and luminescent characteristics of Alq3/TPD OLED: Improvements due to conductive polymer (PEDOT) anode”, Journal of Luminescence, 126, 1, pp.255-229, 2007.