대한전자공학회논문지SD (Journal of the Institute of Electronics Engineers of Korea SD)

대한전자공학회 (The Institute of Electronics and Information Engineers)
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후열 처리 온도 변화에 따른 phosphorus doped ZnO 박막의 전기적 및 광학적 특성

Electrical and Optical Properties of phosphorus doped ZnO Thin Films at Various Post-Annealing Temperatures

  • 한정우 (인하대학교 전자공학과) ;
  • 강성준 (전남대학교 전기및반도체공학과) ;
  • 윤영섭 (인하대학교 전자공학과)
  • Han, Jung-Woo (Dept. of Electronics Engineering, Inha University) ;
  • Kang, Seong-Jun (Dept. of Electrical and Semiconductor Engineering, Chonnam National University) ;
  • Yoon, Yung-Sup (Dept. of Electronics Engineering, Inha University)
  • 발행 : 2009.02.25
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초록

본 연구에서는 sapphire 기판위에 P (phosphorus) 도핑된 ZnO 박막을 제작한 후, 산소 분위기에서 후열 처리 온도가 박막의 전기적 및 광학적 특성에 미치는 영향에 대해서 조사하였다. XRD 측정 결과, 후열 처리 온도에 무관하게 모든 박막이 c축 배향성을 나타내었다. Hall 측정 결과, $850^{\circ}C$에서 후열 처리한 박막에서만 p형 전도 특성이 관찰되었다. 이때의 홀 캐리어 농도와 홀 이동도는 각각 $1.18{\times}1016cm^{-3}$과 $0.96cm^2/Vs$의 값을 나타내었다. 저온 PL 측정 결과, $850^{\circ}C$에서 후열 처리한 박막의 경우 p형 특성을 나타내는 상당량의 억셉터가 관련된 A0X (3.351eV), FA(3.283eV) 및 DAP (3.201eV) 피크가 관찰되었다. 향후 P 도핑된 ZnO 박막의 공정 조건과 후열 처리 조건을 최적화시킨다면, 차세대 광소자에 응용될 수 있는 매우 유망한 재료로 주목받을 것으로 기대된다.

The effects of post-annealing temperature on the optical and electrical properties of P-doped ZnO thin films grown on sapphire substrate have been investigated under oxygen ambient. The XRD shows that regardless of the post-annealing temperature, all P-doped ZnO thin films indicate the c-axis orientation. The results of hall effect measurements indicate the P-doped ZnO thin film annealed at $850^{\circ}C$ exhibits p-type behavior with hole concentration of $1.18{\times}1016cm^{-3}$ and hole mobility of $0.96cm^2/Vs$. The low-temperature (10K) Photoluminescence results reveal that the peak related to the neutral-acceptor exciton (A0X), free electrons to neutral acceptor (FA) and donor acceptor pair (DAP) at 3.351ev, 3.283eV and 3.201eV are observed in the films showing p-type behavior with acceptor. The optimization of deposition and post-annealing conditions will certainly make the P-doped ZnO thin films promising materials for the application to the next generation of optical devices.

키워드

참고문헌

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