Development and Oxidation Resistance of B-doped Silicide Coatings on Nb-based Alloy

  • Li, Xiaoxia (School of Materials Science and Engineering, Beijing University of Aeronautics and Astronautics) ;
  • Zhou, Chungen (School of Materials Science and Engineering, Beijing University of Aeronautics and Astronautics)
  • Published : 2008.08.01

Abstract

Halide-activated pack cementation was utilized to deposit B-doped silicide coating. The pack powders were consisted of $3Wt.c/oNH_4Cl$, 7Wt.c/oSi, $90Wt.c/oAl_2O_3+TiB_2$. B-doped silicide coating was consisted of two layers, an outer layer of $NbSi_2$ and an inner layer of $Nb_5Si_3$. Isothermal oxidation resistance of B-doped silicide coating was tested at $1250^{\circ}C$ in static air. B-doped silicide coating had excellent oxidation resistance, because continuous $SiO_2$ scale which serves as obstacle of oxygen diffusion was formed after oxidation.

Keywords

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