한국정밀공학회지 (Journal of the Korean Society for Precision Engineering)

  • 제25권1호
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  • Pages.130-137
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  • 2008
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  • 1225-9071(pISSN)
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  • 2287-8769(eISSN)
한국정밀공학회 (Korean Society for Precision Engineering)
권호 표지

SU-8 레진을 이용한 이광자 흡수 광조형 공정에서 고강성 3 차원 마이크로 형상 제작을 위한 공정 변수 분석

Study on Process Parameters of a SU-8 Resin in Two-photon Streolithography for the Fabrication of Robust Three-dimensional Microstructures

  • 손용 (한국과학기술원 기계공학과) ;
  • 임태우 (한국과학기술원 기계공학과) ;
  • 이신욱 (한국과학기술원 물리학과) ;
  • 공홍진 (한국과학기술원 물리학과) ;
  • 박상후 (부산대학교 기계공학과) ;
  • 양동열 (한국과학기술원 기계공학과)
  • 발행 : 2008.01.01
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초록

Two-photon stereolithography (TPS) is recognized as a useful process for the fabrication of three-dimensional microstructures. Recently, the need for a two-photon curable resin with high strength increases as 3-D moicrostructures of high aspect ratio or large scale of several hundreds micrometers are required for applications of nano/micro devices in IT/BT. In this work, process parameters of TPS employing the SU-8 which is a representative two-photon curable resin with high strength have been studied for the precise fabrication of 3-D microstructures with high strength. The pre-baking and post-baking processes are studied and the parameter study of the SU-8 in TPS is conducted. Through this work, very small roughness of 12 nm and the minimum aspect ratio of ${\sim}1$ which provides a precise accumulation of layers could be obtained. Using the conditions studied in this work, some 3-D examples are fabricated.

키워드

참고문헌

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