참고문헌
- Crisalle, O. D., Soper, R. A., Mellichamp, D. A. and Seborg, D. E., 'Adaptive Control of Photolithography,' Proceedings of the SPIE, Vol. 1464, pp. 508-526, 1991
- Lachman-Shalem, S., Grosman, B. and Lewin, D. R., 'Nonlinear Modeling and Multivariate Control of Photolithography,' IEEE Transactions on Semiconductor Manufacturing, Vol. 15, No. 3, pp. 310-322, 2002 https://doi.org/10.1109/TSM.2002.801392
- Grosman, B., Lachman-Shalem, S., Swissa, R. and Lewin, D. R., 'Yield Enhancement in Photolithography through Model-based Process Control: Average Mode Control,' IEEE Transactions on Semiconductor Manufacturing, Vol. 18, No. 1, pp. 86-93, 2005 https://doi.org/10.1109/TSM.2004.836654
- Chemali, C. E., Freudenberg, J., Hankinson, M. and Bendik, J. J., 'Run-to-Run Critical Dimension and Sidewall Angle Lithography Control Using the PROLITH Simulator,' IEEE Transactions on Semiconductor Manufacturing, Vol. 17, No. 3, pp. 388-401, 2004 https://doi.org/10.1109/TSM.2004.831530
- Yang,D. S., Jung,M. H., Lee,Y. M., Koh,C. W., Yeo,G. S., Woo,S. G., Cho,H. K. and Moon,J. T., 'Statistical Analysis of CD SEM Measurement and Process Control in the Indistinguishable Multi-Process Patterns,' Proceedings of the SPIE, Vol. 6152, pp. 880-886, 2006
- Levinson, H. J., 'Principles of Lithography,' SPIE Press, pp. 217-225, 2001
- Park, S. J., Lee,M. S., Shin,S. Y., Cho,K. H.,Lim, J. T., Cho,B. S., Jei,Y. H., Kim,M. K. and Park,C. H., 'Run-to-Run Overlay Control of Steppers in Semiconductor Manufacturing Systems Based on History Data Analysis and Neural Network Modeling,' IEEE Transactions on Semiconductor Manufacturing, Vol. 18, No. 4, pp. 605-612, 2005 https://doi.org/10.1109/TSM.2005.858530
- Lee,T. Y., Lee,B. H., Chin,S. B., Cho,Y. S., Hong,J. S., Hong,J. S. and Chang L. S., 'Study of Critical Dimension and Overlay Measurement Methodology Using SEM Image Analysis for Process Control,' Proceedings of the SPIE, Vol. 6152, pp. 837-844, 2006
- Tseng, S. T., Chou, R. J. and Lee, S. P., 'A Study on a Multiple EWMA Controller,' IIE Transactions, Vol. 34, No. 4, pp.541-549, 2002
- Lee, A. C., 'Minimum-Variance Controller for a Class of Non-linear Systems,' International Journal of Systems Science, Vol. 21, No. 11, pp. 2091-2101, 1990 https://doi.org/10.1080/00207729008910532
- Castillo, D. E. and Yeh, J. Y., 'An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Semiconductor Processes,' IEEE Transactions on Semiconductor Manufacturing, Vol. 11, No. 2, pp. 285-295, 1998 https://doi.org/10.1109/66.670178
- Clarke, D. W. and Gawthrop, P. J., 'Self-Tuning Controller,' Proceedings of the IEE, Vol. 122, No. 9, pp. 929-939, 1975
- Belegundu, A. D. and Chandrupatla, T. R., 'Optimization Concepts and Application in Engineering,' Prentice-Hall, pp. 276-279, 1999
- Young, P., 'Recursive Estimation and Time-Series Analysis,' Springer-Verlag, pp. 42-54, 1984
- Liung, L. and Soderstrom, T., 'Theory and Practice of Recursive Identification,' MIT Press, pp. 16-32, 1986
- Graupe, D., 'Time Series Analysis, Identification and Adaptive Filtering,' Kreger, pp. 63-88, 1989