References
- Chou, S. and Krauss, P., 1997, "Imprint lithography with sub-10nm feature size and high throughput," Microelectronic Engineering, Vol. 35, pp. 237-240 https://doi.org/10.1016/S0167-9317(96)00097-4
- Guo, L. J., 2004, "Recent progress in nanoimprint technology and its applications," Journal of Physics D: Applied Physics, Vol. 37, pp. R123-R141 https://doi.org/10.1088/0022-3727/37/11/R01
- Schulz, H., Wissen, M., Bogdanski, N., Scheer, H.-C., Mattes, K., and Friedrich, Ch., 2006, "Impact of molecular weight of polymers and shear rate effects for nanoimprint lithography," Micro-electronic Engineering, Vol. 83, pp. 259-280 https://doi.org/10.1016/j.mee.2005.07.090
- Ruchhoeft, P., Colburn, M., Choi, B., Nounu, H., Johnson, S., Bailey, T., Damle, S., Stewart, M., Ekerdt, J., Sreenivasan, S. V., Wolfe, J. C., and Willsonet, C. G., 1999, "Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography," J. Vac. Sci. Technol. B, Vol. 17, pp. 2965-2969 https://doi.org/10.1116/1.590935
- Resnick, D. J., Dauksher, W. J., Mancini, D., Nordquist, K. J., Bailey, T. C., Johnson, S., Stacey, N., Ekerdt, J. G., Willson, C. G., Sreenivasan, S. V., and Schumaker, N., 2003, "Imprint lithography for integrated circuit fabrication," J. Vac. Sci. Technol. B, Vol. 21, pp. 2624-2631 https://doi.org/10.1116/1.1618238
- Song, Y. J., Shin, D. H., Im, H. J., Jang, S. Y., Lee, K. S., and Jeong, J. I., 2007, "LCD Glass strain Simulation During stage alignment process of Large Size Imprint Equipment," Proceedings of The KSMTE Spring Conference 2007, pp. 108-111
- Lee, K. W., Lee, M. G., Lee, J. W., Lim, S.-H., Shin, D. H., Jang, S. Y., Jeong, J. I., and Yim, H. J., 2007, "Dynamic Analysis of a Nano Imprinting Stage Using CAE," Trans. of the KSMTE, Vol. 16, No. 5, pp. 211-217