References
- E. Froschle and R. Backhus, 'Der Einfluss von sauerstoff auf lichtempfindlichkeit und bildqualitat des Photolacks KTFR', Solid-State Electronics, Vol. 14, No.2, p. 95, 1971
- S. M. Irving, 'A plasma oxidation process for removing photoresist films', Solid State Technol., Vol. 14, p. 47, 1971
-
F.-W. Breitbarth, E. Ducke, and H.-J. Tiller, 'EPR investigation of plasma-chemical resist etching in
$O_2$ and$O_{2}/CF_{4}$ discharges', Plasma Chemistry and Plasma Processing, Vol. 10, No.3, p. 377, 1990 - V. A. Titov, T. G. Shikova, E. V. Kuvaldina, and V. V. Rybkin, 'Kinetic features of the formation of gaseous products upon oxygen-plasma surface treatment of polyethylene, polypropylene, poly(ethylene terephthalate), and polyimide films', High Energy Chemistry, Vol. 36 No.5, p. 354, 2002
- C. D. Dimitrakopoulos and P. L. Malenfant, 'Organic thin film transistors for large area electronics', Adv. Mater. Vol. 14, No.2, p. 99, 2002
-
M. S. Kim, N.-K. Min, S. J. Yun, H. W. Lee, A. Efremov, and K.-H. Kwon, 'On the etching mechanism of
$ZrO_2$ thin films in inductively coupled$BCl_{3}/Ar$ TEX> plasma', Microelectronics Engineering, in press - Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy, Briggs, D. and Seach, M.P., Eds., Chichester: Wiley, 1983
- Handbook of X-ray Photoelectron Spectroscopy, J. F. Moulder at aI., Phisical Electronics: Minnesota, 1995
- F. M. Fowkes, 'Attractive forces at interfaces', Ind. Eng. Chern., Vol. 56, No. 12, p. 40, 1964
- D. K. Owens and R. C. Wendt, 'Estimation of the surface free energy of polymers', J. Appl. Polym. Sci., Vol. 13, p. 1741, 1969
- M. Ya. Digilov, A. I. Zhikharev, and G. V. Neiman, 'Effect of plasma and electrochemical treatment on the dispersion and polar components of the surface energy of carbon fibers', Mechanics of Composite Materials, Vol. 27, No.4, p. 372, 1992