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A Study on the Realization of the High Efficiency LCD Photoresist Removal Technology

고효율 LCD 감광막 제거기술 구현 연구

  • 손영수 (한국기계연구원 지능형생산시스템연구본부) ;
  • 함상용 (한국기계연구원 지능형생산시스템연구본부) ;
  • 김병인 (한국기계연구원 지능형생산시스템연구본부) ;
  • 이성휘 (한국기계연구원 지능형생산시스템연구본부)
  • Published : 2007.11.01

Abstract

The realization of the photoresist(PR) removal method with vaporized water and ozone gas mixture has been studied for the LCD TFT array manufacturing. The developed PR stripper uses the water boundary layer control method based on the high concentration ozone production technology. We develop the prototype of PR stripper and experiment to find the optimal process parameter condition like as the ozone gas flow/concentration, process reaction time and thin boundary layer formation. As a results, we realize the LCD PR strip rate over the 0.4 ${\mu}m/min$ and this PR removal rate is more than 5 times higher than the conventional immersion type ozonized water process.

Keywords

References

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