Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Study on Photolithographic Patterning for P3HT Active Layer

포토리소그래피를 이용한 P3HT 활성층의 패터닝에 대한 연구

  • 박경동 (영남대학교 대학원 전자공학과) ;
  • 남동현 (영남대학교 대학원 전자공학과) ;
  • 박정환 (영남대학교 대학원 전자공학과) ;
  • 한교용 (영남대학교 전자정보공학부)
  • Published : 2007.04.01
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Abstract

We studied on possibility of the application of photolithography technique to patterning the organic active layer poly(3-hexylthiophene) (P3HT). In the case of selective etching method, we made thin oxide film on P3HT thin film using $O_2$ treatment. We achieved the field-effect mobilities in the saturation regime ${\sim}1.2{\times}10^{-3}\;cm^2/V{\cdot}s$, $I_{on/off}$ ratios ${\sim}10^5$ in the selective etching method, ${\sim}7.4{\times}10^{-4}cm^2/V{\cdot}s$, $I_{on/off}$ ratios ${\sim}5{\times}10^3$ in the lift-off one. These values are higher than ones of the unpatterned P3HT-based OTFTs. On the basis of the above results, we demonstrate the photolithographic patterning for P3HT active layer is successfully carried out without degradation of P3HT.

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References

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