References
- 이두희, '플라즈마 디스플레이 패널의 기술동향', 지식재산21 (특허청), 통권 제57호, 11월 1999
- Young Wook Choi, and Jeehyun Kim, 'Reactive sputtering of magnesium oxide thin film for plasma display panel applications'. Thin solid films, Vol. 460, pp. 295-299, 2004 https://doi.org/10.1016/j.tsf.2004.01.066
- Knotek, O., Lugscheider, E., Siry, C.W., 'Tribological properties of B-C thin films deposited by magnetron-sputter-ion plating method', Surface & coatings technology, Vol. 91, No. 3, pp. 167-173, 1997 https://doi.org/10.1016/S0257-8972(96)03105-2
- Kablov, E.N., Muboyadjyan, S.A., Budenovskiy, S.A., Yagodkin, Y.D., Pastuhov, K.M., 'Influence of deposition regimes on structure of ion-plated coatings', Surface & coatings technology, Vol. 93, No. 2/3, pp. 335-338, 1997 https://doi.org/10.1016/S0257-8972(97)00071-6
- Mattox, D.M., 'Ion plating - past, present and future', Surface & coatings technology, Vol. 133/134, pp. 517-521, 2000 https://doi.org/10.1016/S0257-8972(00)00922-1
- Sugimura, H., Sato, Y., Ando, Y., Tajima, N., Takai, O., 'Electron field emission from thin films of amorphous carbon nitride synthesized by arc ion plating', Thin solid films, Vol. 407 No. 1/2, pp. 104-108, 2002 https://doi.org/10.1016/S0040-6090(02)00020-2
- 補本 上進, '大面積 イオンプレーテイングのための高效率 シートプラズマ', 眞空, 第 25 券 11 號, pp. 719-726, 1982
- Souji Komiya and Kazuyuki Tsuruoka, 'Production and Measurement of Dense Metal Ions for Physical Vapor Deposition by a Hollow Cathode Discharge', Proc. 6th Internl. Vacuum Congr., J. Appl. Phys. Suppl, 2, Pt.1, pp. 415-418, 1974