References
- J. Han, P. Q. Mantas, and A. M. R. Senos, 'Effect of Al and Mn Doping on the Electrical Conductivity of ZnO,' J. Eur. Ceram. Soc., 21 [10-11] 1883-86 (2001) https://doi.org/10.1016/S0955-2219(01)00136-4
- S. Fujihara, C. Sasaki, and T. Kimura, 'Effects of Li and Mg Doping on Microstructure and Properties of Sol-Gel ZnO Thin Films,' J. Eur. Ceram. Soc., 21 2109-12 (2001) https://doi.org/10.1016/S0955-2219(01)00182-0
- H. Ko, W.-P. Tai, K.-C. Kim, S.-H. Kim, S.-J. Suh, and Y.- S. Kim, 'Growth of Al-Doped ZnO Thin Films by Pulsed DC Magnetron Sputtering,' J. Crystal Growth, 277 [1/4] 352-58 (2005) https://doi.org/10.1016/j.jcrysgro.2005.01.061
- X. H. Li, A. P. Huang, M. K. Zhu, S. L. Xu, J. Chen, H. Wanh, B. Wang, and H. Yan, 'Influence of Substrate Temperature on the Orientation and Optical Properties of Sputtered ZnO Films,' Mater. Lett., 57 4655-59 (2003) https://doi.org/10.1016/S0167-577X(03)00379-3
- M. Chen, Z. L. Pei, X. Wang, C. Sun, and L. S. Wen, 'Structural, Electrical, and Optical Properties of Transparent Conductive Oxide ZnO:Al Films Prepared by DC Magnetron Reactive Sputtering,' J. Vac. Sci. Technol. A, 19 [3] 963-70 (2001) https://doi.org/10.1116/1.1368836
- M. K. Puchert, P. Y. Timbrell, and R. N. Lamb, 'Postdeposition Annealing of Radio Frequency Magnetron Sputtered ZnO Films,' J. Vac. Sci. Technol. A, 14 [4] 2220-30 (1996) https://doi.org/10.1116/1.580050
- S. Takada, 'Relation between Optical Property and Crystallinity of ZnO Thin Films Prepared by RF Magnetron Sputtering,' J. Appl. Phys., 73 [10] 4739-42 (1993) https://doi.org/10.1063/1.354091
- Z. B. Fang, Z. J. Yan, Y. S. Tan, X. Q. Liu, and Y. Y. Wang, 'Influence of Post-Annealing Treatment on the Structure Properties of ZnO Films,' Appl. Surf. Sci., 241 [3/4] 303-08 (2005) https://doi.org/10.1016/j.apsusc.2004.07.056
- B. D. Cullity and S. R. Stock, 'Elements of X-Ray Diffraction,' pp. 123-31, Prentice Hall, 2001
- X. Zi-Qiang, D. Hong, L. Yan, and C. Hang, 'Al-Doped Effects on Structure, Electrical, and Optical Properties of c- Axis-Orientated ZnO; Al Thin Films,' Materials Science in Semiconductor Processing, 9 [1-3] 132-35 (2006) https://doi.org/10.1016/j.mssp.2006.01.082
- S. Takada, 'Relation between Optical Properties and Crystallinity of ZnO Thin Films Prepared by RF Magnetron Sputtering,' J. Appl. Phys., 73 [10] 4739-42 (1993) https://doi.org/10.1063/1.354091
Cited by
- Design of LED Driving Circuit using Voltage Controlled Ring Oscillator and Lighting Controller vol.24, pp.4, 2010, https://doi.org/10.5207/JIEIE.2010.24.4.001
- Electrical and Optical Properties of the GZO Transparent Conducting Layer Prepared by Magnetron Sputtering Technique vol.24, pp.4, 2010, https://doi.org/10.5207/JIEIE.2010.24.4.110
- Experimental Study on Fabrication of AZO Transparent Electrode for Organic Solar Cell Using Selective Low-Temperature Atomic Layer Deposition vol.37, pp.6, 2013, https://doi.org/10.3795/KSME-B.2013.37.6.577
- Influence of Post-deposition Annealing Temperature on the Properties of GZO/Al Thin Film vol.47, pp.2, 2014, https://doi.org/10.5695/JKISE.2014.47.2.081
- The Characteristics of Multilayer Thin Films Deposited with Metal Thin Films (Ag, Al, Cu) vol.97-101, pp.1662-8985, 2010, https://doi.org/10.4028/www.scientific.net/AMR.97-101.1768
- A Study on the Physical Properties of AZO Films as Variation of Sputtering Conditions vol.287-290, pp.1662-8985, 2011, https://doi.org/10.4028/www.scientific.net/AMR.287-290.54