선형 유도결합 플라즈마 시스템에서 자장에 의한 플라즈마의 Confinement 효과에 관한 연구

Development of Plasma Confinement by Applying Multi-Polar Magnetic Fields in an Internal Inductively Coupled Plasma System

  • 임종혁 (신소재공학과, 성균관대학교) ;
  • 김경남 (신소재공학과, 성균관대학교) ;
  • 염근영 (신소재공학과, 성균관대학교)
  • Lim, Jong-Hyeuk (Department of Materials Science and Engineering, Sungkyunkwan University) ;
  • Kim, Kyong-Nam (Department of Materials Science and Engineering, Sungkyunkwan University) ;
  • Yeom, Geun-Young (Department of Materials Science and Engineering, Sungkyunkwan University)
  • 발행 : 2006.06.30

초록

A novel internal-type linear inductive antenna, which we refer to as a double comb-type antenna, was developed for a large-area plasma source with substrate size of $880\;mm{\times}660\;mm$ ($4^{th}$ generation glass size). In this study, effect of plasma confinement by applying multi-polar magnetic field was investigated. High density plasmas of the order of $3.18{\times}10^{11}\;cm^{-3}$ could be obtained with a pressure of 15 mTorr Ar at an inductive power of 5000 W with good plasma stability. This plasma density is higher than that obtained for the conventional double comb-type antenna, possibly due to the plasma confinement, low rf voltage, resulting in high power transfer efficiency. Also, due to the remarkable reduction in the antenna rf voltage and length, a plasma uniformity of less than 3% could be obtained within a substrate area of $880\;mm{\times}660\;mm$ as rf power increased.

키워드

참고문헌

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