Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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The Characteristics of c-BN Thin Films on High Speed Steel by Electron Assisted Hot Filament C.V.D Systems

EACVD법에 의한 고속도강에의 c-BN박막형성 및 특성에 관하여

  • Lee, Gun-Young (Department of Advanced Materials Science and Engineering, Dankook University) ;
  • Choe, Jean-Il (Department of Advanced Materials Science and Engineering, Dankook University)
  • 이건영 (단국대학교 신소재공학과) ;
  • 최진일 (단국대학교 신소재공학과)
  • Published : 2006.06.30
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Abstract

The characteristic of interface layer and the effect of bias voltage on the microstructure of c-BN films were studied in the microwave plasma hot filament C.V.D process. c-BN films were deposited on a high speed steel(SKH-51) substrate by hot filament CVD technique assisted with a microwave plasma to develop a high performance of resistance coating tool. c-BN films were obtained at a gas pressure of 20 Torr, vias voltage of 300 V and substrate temperature of $800^{\circ}C$ in $B_2H_6-NH_3-H_2$ gas system. It was found that a thin layer of hexagonal boron nitride(h-BN) phase exists at the interface between c-BN layer and substrate.

Keywords

References

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