Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Deposition of $(Ti,Cr)N-MoS_2$ Thin Films by D.C Magnetron Sputtering

  • Kim S.K. (School of Materials Science and Engineering, University of Ulsan) ;
  • Kim J.H. (School of Materials Science and Engineering, University of Ulsan)
  • Published : 2006.04.01
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Abstract

As technology advances, there is a demand for development of hard, solid lubricant coating. (Ti,Cr)N-$MoS_2$, films were deposited on SKD 11 tool steel substrate by co-deposition of $MoS_2$, with (Ti,Cr)N using a D.C. magnetron sputtering process. The influence of the $N_2/Ar$ gas ratio, the deposition temperature, the amount of $MoS_2$ in the films, and the bias voltage on the mechanical and the structural properties of the films were investigated. Wear tests were performed on the films deposited in various conditions.

Keywords

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