참고문헌
- E. Nasser, Fundamentals of Gaseous Ionization and Plasma Electronics, (Wiley and Sons, New York, 1971) Chap. 8 and the references therein
- H. S. Uhm, Phys. Plasmas 7, 4748 (2000)
- H. S. Uhm, J. Kor. Phys. Soc. 38, L295 (2001)
- H. S. Uhm and W. M. Lee, Phys. Plasmas 4, 3117 (1997)
- H. S. Uhm and W. M. Lee, Phys. Lett. A 234, 372 (1997) https://doi.org/10.1016/S0375-9601(97)00494-5
- H. S. Uhm, Phys. Plasmas 6, 4366 (1999) https://doi.org/10.1063/1.873701
- H. S. Uhm, Phys. Plasmas 6, 623 (1999) https://doi.org/10.1063/1.873218
- H. S. Uhm, Phys. Plasma 7, 4770 (2000) https://doi.org/10.1063/1.1310620
- H. S. Uhm, E. H. Choi, and G. S. Cho, Appl. Phys. Lett. 78, 592 (2001) https://doi.org/10.1063/1.1343492
- H. S. Uhm, E. H. Choi, G. Cho, and K. W. Whang, Jpn. J. Appl. Phys. 40, L295 (2001) https://doi.org/10.1143/JJAP.40.L295
- H. S. Uhm, E. H. Choi, S. S. Kim, and K. W. Whang, Phys. Plasma 9, 706 (2002) https://doi.org/10.1063/1.1433664
- H. S. Uhm, E. H. Choi, and G. Cho, Jpn. J. Appl. Phys. 40, 3429 (2001) https://doi.org/10.1143/JJAP.40.3429
- H. S. Uhm, E. H. Choi, and J. Y. Lim, Appl. Phys. Lett. 80, 737 (2002) https://doi.org/10.1063/1.1445470
- H. S. Uhm, E. H. Choi, and K. B. Jung, Phys. Plasma 12, 033507 (2005) https://doi.org/10.1063/1.1846078
- H. S. Uhm, E. H. Choi, and K. B. Jung, J. Kor. Phys. Soc. 47, 242 (2005)
- H. S. Kim, J. H. Kim, B. K. Kang, and H. S. Uhm, Langmuir 21, 12213 (2005) https://doi.org/10.1021/la0521948
- K. H. Han, J. G. Kang, and H. S. Uhm, Submitted
- H. S. Uhm and J. G. Kang, U. S. Patent Application # 10/365, 404 (2003)
- J. G. Kang and H. S. Uhm, Korean Patent # 0545569 (2006)
- D. H. Shin, Y. C. Hong, and H. S. Uhm, Submitted for publication to a journal (2006)
- M. J. Sessler, H. D. Becker, I. Flesch, and K. E. Grund, Cancer Res. Clin Oncol 121, 235 (1995) https://doi.org/10.1007/BF01366968
- H. Y.Lee, H. S. Uhm, H. N. Choi, Y. J. Jung, B. K. Kang, and H. C. Yoo, J. Kor. Phys. Soc. 42, S880, (2003)
- H. S. Uhm, J. G. Kang, H. Y. Lee, and H. S. Kim, Kor. Patent Application #10-2004-0048602 (2004)
- H. J. Kim and S. H. Hong, IEEE Trans. Plasma Science 23, 852 (1995) https://doi.org/10.1109/27.473204
- Han S. Uhm, US 5, 830, 328 (1998)
- K. Hadidi and P. Woskov, US 6, 362, 449 (2002)
- J. H. Kim, Y. C. Hong, H. S. Kim, and H. S. Uhm, J. Korean Phys. Soc. 42, S876 (2003)
- 홍용철, 엄환섭, 이수창, KR 0394994 (2003)
- Han S. Uhm and Sang H. Hong, Combust. Sci. and Tech. 152, 147 (2000) https://doi.org/10.1080/00102200008952131
- Y. C. Hong, H. S. Joe, C. U. Bang, D. H. Shin, J. H. Kim, H. S. Uhm, and W. J. Yi, A. P. L. in press (2006)
- Yong C. Hong and Han S. Uhm, Phys. Plasmas, 10, 3410 (2003) https://doi.org/10.1063/1.1587154
- Han S. Uhm, Yong C. Hong, and Ho J. Kang, US 6, 362, 449 (2003)
- 엄환섭, 홍용철, 강호준, KR Patent 0454085 (2004)
- 신동훈, 홍용철, 엄환섭, KR Patent Pending #10-2006-0016066 (2006)
- 홍용철, 엄환섭, KR 0375423 (2003)
- H. W. Herrmann, I. Henins, J. Park, and G. S. Selwyn, Phys. Plasmas 6, 2284 (1999) https://doi.org/10.1063/1.873480
- K. K. Wintenberg, D. M. Sherman, P. P.-Y. Tsai, R. B. Gadri, F. Karakaya, Z. Chen, J. R. Roth, and T. C. Montie, IEEE Trans. Plasma Sci. 28, 64 (2000) https://doi.org/10.1109/27.842866
- J. G. Brimingham and D. J. Hammerstrom, IEEE Trans. Plasma Sci. 28, 51 (2000) https://doi.org/10.1109/27.842862
- M. Laroussi, I. Alexeff, and W. L. Kang, IEEE Trans. Plasma Sci. 28, 184 (2000) https://doi.org/10.1109/27.842899
- B. M. Penetrante, M. C. Hsiao, J. N. Bardsley, B. T. Merritt, G. E. Vogtlin, A. Kuthi, C. P. Burkhart, and J. R. Bayless, Plasma Sources Sci. Technol. 6, 251 (1997) https://doi.org/10.1088/0963-0252/6/3/002
- B. M. Penetrante, M. C. Hsiao, B. T. Merritt, G. E. Vogtlin, A. Kuthi, C. P. Burkhart, and J. R. Bayless, J. Adv. Oxid. Technol. 2, 299 (1997)
- B. L. Qin, G. V. Barbosa-Canovas, B. G. Swanson, P. D. Pedrow, and R. G. Olsen, IEEE Trans. Ind. Appl. 34, 43 (1998)
- L. Rosocha, in plasma Science and the Environment (W. Manheimer, L. Sugiqama, and T. Stix, Eds. New York ; AIP Press, 1997)
- Yong C. Hong, Jeong H. Kim, and Han S. Uhm, Phys. Plasmas 11, 830 (2004) https://doi.org/10.1063/1.1635822
- Han S. Uhm and Yong C. Hong, US Patent #6, 806, 439 (2004)
- 엄환섭, 홍용철, KR Patent 0554712 (2006)
- N. Hayashi, H. Suganuma, M. Kamatani, S. Satoh, and C. Yamabe, Jpn. J. Appl. Phys. 40, 6104 (2001) https://doi.org/10.1143/JJAP.40.6104
- Yong C. Hong, Hyoung S. Kim, Han S. Uhm, Moon J. Kim, Sun H. Han, Sun C. Ko, and Sang K. Park, IEEE Trans. on Plasma Science 33, 958 (2005) https://doi.org/10.1109/TPS.2005.844595
- Karyn M. Green, M. Cristina Borras, Paul P. Woskov, IEEE Trans. Plasma Sci. 29, 399 (2001) https://doi.org/10.1109/27.922753
- 신동훈, 홍용철, 엄환섭, Korean Patent Pending, 출원번호: 10-2006-0024179 (2006)
- Han S. Uhm and Yong C. Hong, US Patent Pending (2004)
- Y. C. Hong and H. S. Uhm, Phys. Plasmas 12, 053504 (2005) https://doi.org/10.1063/1.1914805
- Shou-Zhe Li, Yong C. Hong, Han S. Uhm, and Zhe-Kui Li, Jpn. J. Appl. Phys. 43, 7714 (2004) https://doi.org/10.1143/JJAP.43.7714
- Y. C. Hong, C. W. Bang, D. H. Shin, and H. S. Uhm, Chem. Phys. Lett. 413, 454 (2005) https://doi.org/10.1016/j.cplett.2005.08.027
- Y. C. Hong, J. H. Kim, C. W. Bang, and H. S. Uhm, Phys. Plasmas 12, 11401 (2005)
- D. H. Shin, Y. C. Hong, and H. S. Uhm, J. Amer. Ceramic Society 88, 2736 (2005) https://doi.org/10.1111/j.1551-2916.2005.00523.x