대한전기학회논문지:전기물성ㆍ응용부문C (The Transactions of the Korean Institute of Electrical Engineers C)

대한전기학회 (The Korean Institute of Electrical Engineers)
권호 표지

사중극자 질량 분석기를 이용한 $BCl_3/Ar$ 유도결합 플라즈마 특성 진단

Diagnostics of Inductively Coupled $BCl_3/Ar$ Plasma Characteristics Using Quadrupole Mass Spectrometer

  • 김관하 (중앙대학 전자전기공학부) ;
  • 김창일 (중앙대학 전자전기공학부)
  • 발행 : 2006.04.01
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

In this study, we investigated the ion energy distributions in a chlorine based inductively coupled plasma by quadrupole mass spectrometer with an electrostatic ion energy analyzer. Ion energy distributions are presented for various plasma parameters such as $BCl_3/Ar$ gas mixing ratio, RF power, and process pressure. As the $BCl_3/Ar$ gas mixing ratio and process pressure decreases, and RF power increases, the saddle-shaped structures is enhanced. The reason is that there are ionized energy difference between $BCl_3$ and Ar, change of plasma potential, alteration of mean free path. and variety of ion collision in the sheath.

키워드

참고문헌

  1. I.H. Hutchinson, 'Principles of Plasma Diagnostics', Cambridge University Press, PP. 1-10, 2002
  2. F. Gaboriau, M.C. Peignon, G. Cartry, L. Rolland, D. Eon, C. Cardinaud, and G. Turban, 'Langmuir probe measurements in an inductively coupled plasma : Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO2', J. Vac. Sci. Technol. A, Vol. 20, Issue 3, PP. 919-927, 2002 https://doi.org/10.1116/1.1474419
  3. P.H. Dawson, 'Quadrupole Mass Spectrometry and Its Applications', AIP Press, PP. 1-8, 1995
  4. I.P. Herman, 'Optical Dagnostics for Thin Film Processing', Academic Press, PP. 1-56, 1996
  5. 김정훈, '레이저 유기 형광법을 이용한 플라즈마내의 밀도 및 전계 측정에 관한 연구', 서울대학교 박사학위논문, PP. 1-3, 2001
  6. R.J Shul, S.J. Pearton, 'Handbook of advanced plasma processing techniques', Springer, PP. 146-166, 2000
  7. R. Chen, H. Huang, and C.J. Spanos, M. Gatto, 'Plasma etch modeling using optical emission spectroscopy', J. Vac. Sci. Technol. A, Vol. 14, Issue 3, PP. 1901-1906, 1996 https://doi.org/10.1116/1.580357
  8. J.K, Olthoff, R.J. Van Brunt, S.B. Radovanov, and J.A. Rees, 'Use of an ion energy analyser-mass spectrometer to measure ion kinetic-energy distributions from RF discharges in argon-helium gas mixtures', IEE Proc.Sci. Mens. Technol., Vol. 141, No.2, PP. 111-117, 1994 https://doi.org/10.1049/ip-smt:19949920
  9. R. Foest, J.K. Olthoff, R.J. Van Brunt, E.C. Benck, and J.R Roberts, 'Optical and mass spectrometric investigations of ions and neutral species in $SF_6$ radio-frequency discharges', Physical Review E, Vol. 54, No.2, PP. 1876-1887, 1996 https://doi.org/10.1103/PhysRevE.54.1876
  10. N. Takahashi, K Yanagishita, T. Hayashi, H. Akimichi, and Y. Tuzi, 'Development of the quadruple mass spectrometer with bessel-box type energy analyzer for the accurate measurement of partial pressures', Applied Surface Science, Vol. 169-170, No. 15, PP. 752-756, 2001 https://doi.org/10.1016/S0169-4332(00)00785-6
  11. K. Okada and S. Komatsu, 'Mass spectrometric studies of low pressure $CH_4$, $CH_4$/$H_2$, and $H_2$ plasma beams generated by an inductively coupled radio frequency discharge', J. Vac. Sci. Technol. A, Vol. 20, Issue 6, PP. 1835-1839, 2002 https://doi.org/10.1116/1.1506171
  12. Y. lin, C. Takahashi, and T. Ono, 'Real-time etching monitor using argon Quadrupole mass spectrometry for 100 nm class WSiN gate fabrication', J. Vac. Sci. Technol. A, Vol. 21, Issue 5, PP. 1589-1594, 2003 https://doi.org/10.1116/1.1589527
  13. P. Chabert, R.W. Boswell, and C. Davis, 'Investigation of a $SF_6$ helicon plasma', J. Vac. Sci. Technol. A, Vol. 16, Issue 1, PP. 78-86, 1998 https://doi.org/10.1116/1.581015
  14. C. Wild and P. Koida, 'Ion and electron dynamics in the sheath of radio-frequency glow discharge', J. Appl, Phys., Vol. 69, Issue 5, PP. 2909-2922, 1991 https://doi.org/10.1063/1.348601
  15. B.A. Huber, 'Charge transfer of $Ar^{2+}$in He, Ne, and Ar', J. Phys. B ; Atom. Mole. Phys., Vol. 13, Issue 4, PP. 809-818, 1980 https://doi.org/10.1088/0022-3700/13/4/015
  16. S.G. Walton, D. Leonhardt, D.D. Blackwell, R.F. Dernsler, D.P. Murphy, and R.A. Meger, 'Ion energy distributions in a pulsed, electron beam-generated plasma', J. Vac, Sci. Technol. A 19, Issue 4, PP. 1325-1329, 2001 https://doi.org/10.1116/1.1345901
  17. Z.Y. Fan and N Newman, 'Kinetic energy distribution of nitrogen ions in an electron cyclotron resonance plasma', J. Vac. Sci. Technol. A, Vol. 16, Issue 4, PP. 2132-2139, 1998 https://doi.org/10.1116/1.581320
  18. Alfred Grill, 'Cold Plasma in Materials Fabrication from Fundamentals to Applications' IEEE Press, PP. 230-231, 1993