한국인쇄학회지 (Journal of the Korean Graphic Arts Communication Society)

한국인쇄학회 (The Korean Graphic Arts Communication Society)
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열선 차단 필름용 니켈 착화합물의 합성과 특성

Synthesis and Properties of Nickel Complexes for the Thermal Shielding Film

  • 곽선엽 (부산정보대학 산업디자인학부 시각디자인계열) ;
  • 이태훈 (부경대학교 공과대학 화상정보공학부 인쇄정보공학과) ;
  • 손세모 (부경대학교 공과대학 화상정보공학부 인쇄정보공학과)
  • Kwak, Seon-Yeep (Department of Visual Design, Busan College of Information Technology) ;
  • Le, Tae-Hoon (Division of Image & Information, College of Engineering, Pukyong National University) ;
  • Son, Se-Mo (Division of Image & Information, College of Engineering, Pukyong National University)
  • 발행 : 2006.12.01
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초록

In this paper, a transparent film exposed the effect of heat cut-off, reveal as means of the prevention to wrong operation of parts of display and forgery of the credit card, also it will intercept rising of the temperature in interior of a room and car by diminish the influx of near-infrared ray wavelength of solar energy come from the window. As in the past a film which absorb a wavelength of $800{\sim}2500nm$ in near-infrared ray, manufactured in physical vapor deposition(PVD), chemical vapor deposition(CVD) to using ATO, ITO of inorganic materials or sputtering method. but it has lots of problem in manufacture. On the other hand, recently a paper said it easily form a transparent film to using organic dye. This paper show synthesis of many derivatives used in Ni-complex and then it investigate to optical property and durability of flim by make the transparent film.

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