Transactions on Electrical and Electronic Materials

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Homeotropic Alignment Effect for Nematic Liquid Crystal on the SiOx Thin Film Layer by New Ion Beam Exposure

  • Han, Jeong-Min (Department of Electrical and Electronic Engineering, Yonsei University) ;
  • Choi, Sung-Ho (Department of Electrical and Electronic Engineering, Yonsei University) ;
  • Kim, Byoung-Yong (Department of Electrical and Electronic Engineering, Yonsei University) ;
  • Han, Jin-Woo (Department of Electrical and Electronic Engineering, Yonsei University) ;
  • Hwang, Jeoung-Yeon (Department of Electrical and Electronic Engineering, Yonsei University) ;
  • Ok, Chul-Ho (Department of Electrical and Electronic Engineering, Yonsei University) ;
  • Seo, Dae-Shik (Department of Electrical and Electronic Engineering, Yonsei University)
  • Published : 2006.12.30
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Abstract

We studied homeotropic alignment effect for a nematic liquid crystal (NLC) on the $SiO_{x}$ thin film irradiated by the new ion beam method. $SiO_{x}$ thin films were deposited by plasma enhanced chemical vapor deposition (PECVD) and were treated by the DuoPIGatron ion source. A uniform liquid crystal alignment effect was achieved over 2100 eV ion beam energy. Tilt angle were about $90^{\circ}$ and were not affected by various ion beam energy.

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References

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