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http://dx.doi.org/10.4313/TEEM.2006.7.6.293

Homeotropic Alignment Effect for Nematic Liquid Crystal on the SiOx Thin Film Layer by New Ion Beam Exposure  

Han, Jeong-Min (Department of Electrical and Electronic Engineering, Yonsei University)
Choi, Sung-Ho (Department of Electrical and Electronic Engineering, Yonsei University)
Kim, Byoung-Yong (Department of Electrical and Electronic Engineering, Yonsei University)
Han, Jin-Woo (Department of Electrical and Electronic Engineering, Yonsei University)
Hwang, Jeoung-Yeon (Department of Electrical and Electronic Engineering, Yonsei University)
Ok, Chul-Ho (Department of Electrical and Electronic Engineering, Yonsei University)
Seo, Dae-Shik (Department of Electrical and Electronic Engineering, Yonsei University)
Publication Information
Transactions on Electrical and Electronic Materials / v.7, no.6, 2006 , pp. 293-296 More about this Journal
Abstract
We studied homeotropic alignment effect for a nematic liquid crystal (NLC) on the $SiO_{x}$ thin film irradiated by the new ion beam method. $SiO_{x}$ thin films were deposited by plasma enhanced chemical vapor deposition (PECVD) and were treated by the DuoPIGatron ion source. A uniform liquid crystal alignment effect was achieved over 2100 eV ion beam energy. Tilt angle were about $90^{\circ}$ and were not affected by various ion beam energy.
Keywords
Homeotropic alignment effect; Nematic liquid crystal; $SiO_{x}$; thin film; Plasma enhanced chemical vapor deposition; Ion beam method; Tilt angle;
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Times Cited By KSCI : 1  (Citation Analysis)
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