Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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The ESCA Analysis of Hydroxyapatite Thin Films Deposited by RF Sputtering

RF 스퍼터링으로 증착된 하이드록시아파타이트 박막의 ESCA 분석

  • Jung, Chan-Hoi (Dept. of Materials Science and Engineering, Donga University) ;
  • Lee, Jun-Hee (Dept. of Materials Science and Engineering, Donga University) ;
  • Kim, Soon-Kook (Dept. of Materials Science and Engineering, Donga University) ;
  • Kim, Myung-Han (Dept. of Materials Engineering, Chungbuk National University) ;
  • Yu, Jae-Keun (Dept. of Advanced Materials Engineering, Hoseo University) ;
  • Kim, Seung-Eon (Korea Institute Machinery & Materials)
  • Published : 2006.04.27
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Abstract

RF sputtering process was applied to produce thin hydroxyapatite(HAp) films on Ti-6Al-4V alloy substrates. The effects of different heat treatment conditions on the chemical composites between HAp thin films and Ti-6Al-4V alloy substrates were studied. After deposition, the HAp thin films were heat treated for 1h at $400^{\circ}C,\;600^{\circ}C\;and\;800^{\circ}C$ under the atmosphere, and analyzed O/M, FESEM-EDX and ESCA, respectively. Experimental results represented that interface of HAp thin films and Ti-6Al-4V alloy substrates was composed Ti-OH, TiO, TiN, $Al_2O_3,\;V_2O_3,\;VO_2$. pyrophosphate and decreased carbide followed by the increase of heat treatment temperature.

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References

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