International Journal of Precision Engineering and Manufacturing

Korean Society for Precision Engineering (한국정밀공학회)
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Nanohole Fabrication using FIB, EB and AFM for Biomedical Applications

  • Zhou, Jack (Department of Mechanical Engineering and Mechanics, Drexel University) ;
  • Yang, Guoliang (Department of Physics, Drexel University)
  • Published : 2006.10.01
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Abstract

Although many efforts have been made in making nanometer-sized holes, there is still a major challenge in fabricating individual single-digit nanometer holes in a more controllable way for different materials, size distribution and hole shapes. In this paper we describe our efforts to use a top down approach in nanofabrication method to make single-digit nanoholes. There are three major steps towards the fabrication of a single-digit nanohole. 1) Preparing the freestanding thin film by epitaxial deposition and electrochemical etching. 2) Making sub-micro holes ($0.2{\mu}\;to\;0.02{\mu}$) by focused ion beam (FIB), electron beam (EB), atomic force microscope (AFM), and others methods. 3) Reducing the hole size to less than 10 nm by epitaxial deposition, FIB or EB induced deposition and micro coating. Preliminary work has been done on thin films (30 nm in thickness) preparation, sub-micron hole fabrication, and E-beam induced deposition. The results are very promising.

Keywords

References

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